Mitsubishi Gas Chemical
A Tokyo-based chemical company whose semiconductor materials include high-purity hydrogen peroxide and other chemicals for wafer cleaning.
三菱ガス化学・Process chemicals, gases and targets・Last updated: October 27, 2026
Overview
Mitsubishi Gas Chemical is headquartered in Chiyoda, Tokyo. Its semiconductor business supplies high-purity hydrogen peroxide and cleaning chemicals used in wafer processing.
It also makes a wide range of specialty chemicals.
The standard RCA clean uses mixtures of hydrogen peroxide with ammonia (SC1) and with hydrochloric acid (SC2) to remove particles and metals, and sulfuric acid with hydrogen peroxide (SPM) to strip organics. Because these solutions touch the bare wafer surface, metal impurities in hydrogen peroxide are controlled at very low levels.
Business: High-purity hydrogen peroxide and cleaning chemicals
Why it matters
- Hydrogen peroxide is a component of the standard SC1, SC2 and SPM cleans, so fabs consume it in large volumes.
- Purity requirements for cleaning chemicals tighten with each process node.
Main products
- •High-purity hydrogen peroxide
- •Wafer cleaning chemicals
Sites in Japan
Chiyoda, Tokyo