Products
Japanese Semiconductor Equipment Products
Semiconductor equipment and materials made by Japanese companies, listed by maker. Each product page has specifications, applications and sources from the maker's official information.
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- Products382
- Makers95
- Categories144
Tokyo Electron (TEL) (44)
- ALPHA-8SE™ iDiffusion furnaces
- ANTARES™Dry cleaning equipment
- Cellcia™Wafer probers
- CELLESTA™-iSingle-wafer cleaning equipment
- CELLESTA™-i MDSingle-wafer cleaning equipment
- CELLESTA™ MS2Wafer scrubbers
- CELLESTA™ Pro SPMWet resist strip equipment
- CELLESTA™ SCDWafer dryers
- Certas LEAGA™Dry cleaning equipment
- CLEAN TRACK™ LITHIUS Pro™Coater/developers
- CLEAN TRACK™ LITHIUS Pro™ APCoater/developers
- CLEAN TRACK LITHIUS Pro DICECoater/developers
- CLEAN TRACK™ LITHIUS Pro™ VCoater/developers
- CLEAN TRACK LITHIUS Pro ZCoater/developers
- Episode™ 1CVD equipment
- Episode™ 2 DMRCVD equipment
- Episode™ ULEtchers by material
- EVAROS™Diffusion furnaces
- EXIM™PVD equipment
- EXPEDIUS™-iWet etching equipment
- LEXIA™-EXPVD equipment
- NS300ZWafer scrubbers
- NT333™ALD equipment
- Precio octo™Wafer probers
- Precio™ XLWafer probers
- Prexa™Wafer probers
- Prexa™ MSWafer probers
- Prexa™ SDPFinal test equipment
- Synapse™ SiCMOS image sensor manufacturing equipment
- Synapse™ V / Synapse™ Z PlusTSV formation equipment
- Tactras™Dry etching equipment
- TELFORMULA™Diffusion furnaces
- TELINDY PLUSDiffusion furnaces
- TELINDY PLUS™ IRad™ALD equipment
- Triase+™ EX-II™ TiNCVD equipment
- Triase+™ SPAiRapid thermal processing (RTP) equipment
- Triase+™ Ti/TiNCVD equipment
- Triase+™ WCVD equipment
- Ulucus™ GBackgrinders
- Ulucus™ LHybrid bonding equipment
- Ulucus™ LXHybrid bonding equipment
- UNITY™ Me+SiC power semiconductor equipment
- WDF™ 12DP+Wafer probers
- ZETA™+Batch wafer cleaning equipment
DISCO (40)
- DAD3350Dicing saws
- DAD3361Dicing saws
- DAD3660Dicing saws
- DAG810Backgrinders
- DAL7440Wire saws and wafer slicing equipment
- DAS8930Wafer-level packaging equipment
- DAW4110Dicing saws
- DDS2030Laser dicing equipment
- DDS2300Laser dicing equipment
- DFD6240Dicing saws
- DFD6340Dicing saws
- DFD6361Dicing saws
- DFD6362Dicing saws
- DFD6363Dicing saws
- DFD6450Dicing saws
- DFD6560Dicing saws
- DFD6760Dicing saws
- DFG8340Backgrinders
- DFG8360Backgrinders
- DFG8540Backgrinders
- DFG8560Backgrinders
- DFG8830Backgrinders
- DFL7160Laser dicing equipment
- DFL7262Laser dicing equipment
- DFL7341Laser dicing equipment
- DFL7362Laser dicing equipment
- DFL7362FHLaser dicing equipment
- DFL7560LLaser dicing equipment
- DFL7562Laser dicing equipment
- DFM2800Wafer mounters
- DFP8140Wafer polishers (back end)
- DFP8160Wafer polishers (back end)
- DFS8960Wafer-level packaging equipment
- DGP8761Backgrinders
- DGP8762Backgrinders
- DIS100Final test equipment
- DME8061Wafer polishers (back end)
- DMM9200Wafer mounters
- NBC-Z seriesDicing blades and consumables
- ZH05Dicing blades and consumables
Advantest (31)
- 7038 System-Level Test SystemFinal test equipment
- B6700 seriesBurn-in systems
- EVA100Analog test systems
- EXAVISPower semiconductor manufacturing equipment
- H5620Memory test systems
- HA1200Wafer probers
- HA7200MEMS manufacturing equipment
- HA7300MEMS manufacturing equipment
- M4173Test handlers
- M4841Test handlers
- M4872Test handlers
- M5241Test handlers
- M6242Test handlers
- MASK CD-SEM E3660Mask dimension and flatness metrology
- MASK DR-SEM E5620Mask inspection equipment
- MASK MVM-SEM® E3640Mask dimension and flatness metrology
- MASK MVM-SEM® E3650Mask dimension and flatness metrology
- MT100 / MT200Power semiconductor manufacturing equipment
- T2000Final test equipment
- T5221Memory test systems
- T5230Memory test systems
- T5503HS2Memory test systems
- T5511Memory test systems
- T5801Memory test systems
- T5830Memory test systems
- T5833Memory test systems
- T5835Memory test systems
- T5851 / T5851ESMemory test systems
- T6391Mixed-signal test systems
- V93000 Power and Analog SolutionsAnalog test systems
- V93000 EXA ScaleLogic test systems
Lasertec (29)
- ABICS E120Mask inspection equipment
- ABICS E320Mask inspection equipment
- ACTIS A150Mask inspection equipment
- ACTIS A200HiT seriesMask inspection equipment
- ACTIS A300 seriesMask inspection equipment
- BASIC seriesMask inspection equipment
- BGM300TSV formation equipment
- BIM300Surface profilers
- CIEL seriesMacro inspection equipment
- CIRIUS seriesDefect inspection equipment
- EZ300Macro inspection equipment
- GALOIS211Crystal defect inspection equipment
- LX seriesMacro inspection equipment
- MAGICS M5640Wafer substrate inspection equipment
- MAGICS M6750 / M6751Mask inspection equipment
- MAGICS M9650 / M9651Mask inspection equipment
- MAGICS M9750 / M9751Mask inspection equipment
- MATRICS X712 seriesMask inspection equipment
- MATRICS X810EX seriesMask inspection equipment
- MATRICS X8ULTRA seriesMask inspection equipment
- MATRICS X9ULTRA seriesMask inspection equipment
- MPM193 seriesMask dimension and flatness metrology
- MPM248Mask dimension and flatness metrology
- MZ100Mask inspection equipment
- OPTELICS® HYBRID+Electron microscopes for observation (SEM/TEM)
- PELMIS seriesMask inspection equipment
- SICA108Crystal defect inspection equipment
- SICA88Crystal defect inspection equipment
- VIANCA seriesTSV formation equipment
SCREEN Holdings (26)
- CW-2000Batch wafer cleaning equipment
- DR-8000Mask dimension and flatness metrology
- DT-3000 (SOKUDO DUO)Coater/developers
- DW-3100Laser direct imaging systems
- FC-3100Batch wafer cleaning equipment
- FC-821LBatch wafer cleaning equipment
- LA-3100Laser annealing equipment
- RE-3500Ellipsometers
- RF-200EX / RF-300EXCoater/developers
- SB-3300Wafer scrubbers
- SC-80EXCoater/developers
- SK-60EX / SK-80EXCoater/developers
- SP-2100Wet etching equipment
- SS-3200Wafer scrubbers
- SS-3300SWafer scrubbers
- SS-80EXWafer scrubbers
- SU-2000Single-wafer cleaning equipment
- SU-3200Wet cleaning equipment
- SU-3300Wet etching equipment
- SU-3400Wet resist strip equipment
- VM-1020Film thickness metrology
- VM-1200 / VM-1300Film thickness metrology
- VM-2500 / VM-3500Film thickness metrology
- WS-620C / WS-820C / WS-820LBatch wafer cleaning equipment
- ZI-2000Macro inspection equipment
- ZI-3600Macro inspection equipment
ULVAC (25)
- CC-200PECVD equipment
- CCMT-D seriesVacuum gauges
- CMEPECVD equipment
- CME-200ECVD equipment
- CSSputtering equipment
- ei-5Vacuum evaporation equipment
- ei-5 / EVD-600LPVacuum evaporation equipment
- ENTRON-EX W300PVD equipment
- ENTRON-EXXPVD equipment
- H83 / H84Diffusion furnaces
- HELIOT 900 seriesLeak detectors
- IHHigh-energy ion implanters
- IMX-3500Medium-current ion implanters
- Luminous NA seriesAshing equipment
- NE-550EXDry etching equipment
- NLD-570MEMS manufacturing equipment
- NLD-5700MEMS manufacturing equipment
- RISE-300Dry cleaning equipment
- SEGul-200Compound semiconductor equipment
- SMESputtering equipment
- SOPHIMedium-current ion implanters
- SOPHI-400High-energy ion implanters
- SRHSputtering equipment
- uGmni-200CPECVD equipment
- uGmni-200EDry etching equipment
Hitachi High-Tech (16)
- 9000 seriesPolysilicon etchers
- ArBlade® 5000Decapsulation and cross-sectioning equipment
- CG7300CD-SEMs
- CR7300Review SEMs
- CS5000CD-SEMs
- CT1000Review SEMs
- CV7300CD-SEMs
- DI2800Optical wafer inspection equipment
- DI4600Wafer inspection equipment
- GT2000CD-SEMs
- LS9300ADParticle inspection equipment
- M-600 / 6000 seriesPower semiconductor manufacturing equipment
- M-8000 seriesPolysilicon etchers
- NEXTA® STA200Thermal analysis instruments (TG-DTA/DSC)
- NanoProber® NP8000Failure analysis equipment
- SU7000Electron microscopes for observation (SEM/TEM)
Nikon (13)
- AMI-5700Macro inspection equipment
- DSP-100Laser direct imaging systems
- Litho BoosterOverlay metrology
- NSR-2205iL1i-line steppers
- NSR-S215DDUV lithography systems
- NSR-S220DDUV lithography systems
- NSR-S322FDUV lithography systems
- NSR-S333FDUV lithography systems
- NSR-S625EDUV lithography systems
- NSR-S635EDUV lithography systems
- NSR-S636EDUV lithography systems
- NSR-SF155i-line steppers
- OPTISTATION-3200Macro inspection equipment
Canon (11)
- FPA-1200NZ2CNanoimprint lithography (NIL)
- FPA-3030EX6DUV lithography systems
- FPA-3030i5ai-line steppers
- FPA-3030i6i-line steppers
- FPA-3030iWai-line steppers
- FPA-5520iVWafer-level packaging equipment
- FPA-5550iXi-line steppers
- FPA-5550iZ2i-line steppers
- FPA-6300ES6aDUV lithography systems
- FPA-6300ESWDUV lithography systems
- FPA-8000iWWafer-level packaging equipment
Kokusai Electric (10)
- Advanced TSURUGIALD equipment
- Advanced TSURUGI Plus-ⅢALD equipment
- AdvancedAce®-IILPCVD equipment
- MARORA®Rapid thermal processing (RTP) equipment
- QUIXACE®-IICVD equipment
- QUIXACE®-LVEpitaxial growth equipment
- TANDUORapid thermal processing (RTP) equipment
- TSURUGI-C²®ALD equipment
- VERTEX RevolutionOxidation furnaces
- VR300DH3Sheet resistance measurement
Ebara (5)
- EV-M seriesVacuum pumps
- F-REX300XMetal CMP equipment
- F-REX300XAOxide CMP equipment
- TND-Single (including TND-Single Plus)Exhaust gas abatement systems
- UFP600ASTSV formation equipment
JEOL (5)
- Cross Section Polisher™ IB-19530CPDecapsulation and cross-sectioning equipment
- JAMP-9510FSurface analysis instruments (XPS/SIMS)
- JBX-3200MVSElectron-beam mask writers
- JBX-8100FSElectron-beam direct write systems
- JSM-IT810Electron microscopes for observation (SEM/TEM)
Tokyo Seimitsu (ACCRETECH) (5)
- AD3000T-PLUSDicing saws
- ChaMP211Metal CMP equipment
- ChaMP332Oxide CMP equipment
- FTB/CCB series hub bladesDicing blades and consumables
- UF3000EX-eWafer probers
ESPEC (4)
- EHS series HAST chambers (standard type)Accelerated life test (HAST) equipment
- Platinous J seriesTemperature and humidity test chambers
- RBC series burn-in chambersBurn-in systems
- TSA series thermal shock chambersThermal shock test chambers
Shimadzu (4)
- DSC-60 Plus seriesThermal analysis instruments (TG-DTA/DSC)
- ICPMS-2050Contamination analysis equipment
- IRXrossOrganic analysis instruments
- KRATOS ULTRA2 (AXIS Supra+)Surface analysis instruments (XPS/SIMS)
Hamamatsu Photonics (3)
- Plasma process monitor C10346-01Process monitors (EPD/OES)
- Photoionizer L12645Ionizers (static elimination)
- PHEMOS-X emission microscope C15765-01Failure analysis equipment
HORIBA (3)
- CRITERION D500Mass flow controllers (MFC)
- LabRAM Odyssey SemiconductorOrganic analysis instruments
- UVISEL PlusEllipsometers
Koyo Thermo Systems (JTEKT Thermo Systems) (3)
Rigaku (3)
- Thermo plus EVO2 TG-DTA seriesThermal analysis instruments (TG-DTA/DSC)
- TXRF 3760Surface analysis instruments (XPS/SIMS)
- WaferX 310Film composition analysis (XRF/FTIR)
Shinko Electric Industries (3)
- DLL® / DLL3® (flip-chip package substrates)Package substrates (FC-BGA)
- i-THOP® (substrate for 2.3D packages)Interposer assembly equipment
- QFN/QFP and TSOP lead framesLead frames
Sumitomo Heavy Industries Ion Technology (3)
- MC3-Ⅱ(MC)Medium-current ion implanters
- S-UHE / SS-UHE ⅡHigh-energy ion implanters
- SHX-Ⅲ(HC)High-current ion implanters
Yokogawa Electric (3)
- CELLBrainEquipment engineering systems (EES)
- CIMVision-semiManufacturing execution systems (MES)
- EQBrainEquipment interfaces (SECS/GEM)
Dai Nippon Printing (DNP) (2)
- EUV photomasks (2 nm generation and beyond)Photomasks
- QFN lead framesLead frames
Fasford Technology (2)
- DB820Die bonders
- DB830plus+ seriesDie bonders
Fujikin (2)
- FCS®-P8500Mass flow controllers (MFC)
- IGS® integrated gas systemFluid and gas components (fittings and tubing)
Hugle Electronics (2)
- UPC-12500 (SORA) FOUP/FOSB cleaning systemCarrier cleaning equipment
- IRISYS®-SXIonizers (static elimination)
IWAKI (2)
- FS-H series air-driven bellows pumpsChemical pumps (bellows pumps)
- FS-N series air-driven bellows pumpsChemical pumps (bellows pumps)
Kobelco Research Institute (2)
- LTA-2200EP/FCarrier lifetime measurement
- SBW series flatness and shape measurement systemsWafer substrate inspection equipment
Kusumoto Chemicals (ETAC) (2)
- HIFLEX SC (SIMPLICORE)Temperature and humidity test chambers
- WINTECH NEO NT550AThermal shock test chambers
LINTEC (2)
- Adwill (dicing tapes and BG tapes)Dicing and backgrinding tapes
- Adwill RAD-2512F/12Wafer mounters
Murata Machinery (Muratec) (2)
- CDS350-M3 clean stockerStockers
- CDWX bare wafer stockerStockers
Musashi Engineering (2)
Napson (2)
- NC-80MAPWafer substrate inspection equipment
- RT-3000 / RG-2000Sheet resistance measurement
Nissin Ion Equipment (2)
- EXCEED3000AHMedium-current ion implanters
- IMPHEAT-IISiC power semiconductor equipment
Nitta DuPont (2)
- IC1000™ seriesPolishing pads and carrier parts
- Suba™ seriesPolishing pads and carrier parts
Otsuka Electronics (2)
- FE-300F film thickness monitorProcess monitors (EPD/OES)
- FE-5000 seriesEllipsometers
RORZE (2)
- ACE SORTERWafer sorters
- RR493 series (vacuum SCARA arm)Wafer handling robots
Shibaura Mechatronics (2)
- ARTS® (MC-150 series)Mask cleaning and drying equipment
- FOC300 series FOSB/FOUP cleaning systemsCarrier cleaning equipment
SpeedFam (2)
- DSM seriesDouble-side polishers (DSP)
- EP-300-XWafer edge polishers
Taiyo Nippon Sanso (2)
- Cylinder cabinets / BSGS / IGSSGas supply systems and bulk gas equipment
- SR-4000HTMOCVD equipment
ULVAC-PHI (2)
- PHI GENESISSurface analysis instruments (XPS/SIMS)
- PHI nanoTOF 3+Contamination analysis equipment
WINTEST (2)
- BI-M series monitor burn-in systemsBurn-in systems
- WTS-377CMOS image sensor manufacturing equipment
Air Water (1)
- Mega™ MFⅦSlurry delivery and recovery systems
Anritsu Meter (1)
- AW series thermocouple wafersInstrumented wafers
Apic Yamada (1)
- WCM-330Molding (encapsulation) equipment
Cambridge Filter Corporation (1)
- Absolute Filter GIGA (ULPA) Mini-Pleat GA6HEPA and ULPA air filters
CKD (1)
- PGM seriesPressure controllers and flow meters
Daifuku (1)
- Clean Stocker CLS-50Stockers
ELIONIX (1)
- ELS-BODEN seriesElectron-beam direct write systems
EpiQuest (1)
- RC1100Molecular beam epitaxy (MBE) equipment
Fujimi Incorporated (1)
- GLANZOXPolishing pads and carrier parts
Gigaphoton (1)
- GT66AExcimer lasers
Hitachi Power Solutions (1)
- FineSAT 7Scanning acoustic microscopes (SAT)
HOYA (1)
- EUV mask blanksPhotomask blanks
IBIDEN (1)
- FC-BGA substratesPackage substrates (FC-BGA)
Iwasaki Electric (1)
- I Ozone PowerOzonated water generators
JASCO (1)
- FT/IR-4XOrganic analysis instruments
JSR (1)
- Inpria metal oxide EUV resistsEUV resists
Kanken Techno (1)
- KT1000 seriesExhaust gas abatement systems
Kashiyama Industries (1)
- NeoDry G seriesVacuum pumps
KITZ SCT (1)
- NRD series high-pressure diaphragm valvesFluid and gas components (fittings and tubing)
Kyocera (1)
- FC-BGA substratesPackage substrates (FC-BGA)
Micronics Japan (1)
- U-ProbeProbe cards
Miraial (1)
- 300mm FOUPWafer carriers, FOUPs and EFEMs
Mitsui Chemicals (1)
- ICROS Tape (backgrinding surface protection tape)Dicing and backgrinding tapes
Mitsui High-tec (1)
- QFN/QFP lead frames (stamped / etched)Lead frames
New Cosmos Electric (1)
- PS-8 seriesGas detection systems
NGK Insulators (1)
- Bonded wafers for SAW filtersSpecialty substrates (sapphire, LT/LN, glass)
Nihon Superior (1)
- SN100CSolder materials
Nippon Thompson (IKO) (1)
- NanoLinear® NT seriesPrecision stages and interferometers
Nitto Denko (1)
- ELEP HOLDER (dicing tapes)Dicing and backgrinding tapes
NuFlare Technology (1)
- MBM-3000Electron-beam mask writers
Okamoto Machine Tool Works (1)
- PNX332BWafer polishing and edge grinding equipment
PILLAR (1)
- Super 300 type PILLAR Fitting™High-purity piping
Plasma-Therm Japan (1)
- VERSALINE® ICPDry etching equipment
Riken Keiki (1)
- SD-3 series (gas detector heads with signal converter)Gas detection systems
SAMCO (1)
- PC-300 plasma cleanerPlasma cleaners for packaging
Senju Metal Industry (1)
- ECO SOLDER M705 (solder balls)Assembly materials
Shin-Etsu Polymer (1)
- FOUP300EXWafer carriers, FOUPs and EFEMs
Shishido Electrostatic (1)
- BF-X2ME (WINSTAT)Ionizers (static elimination)
Showa Shinku (1)
- SEC-22CVacuum evaporation equipment
SPP Technologies (1)
- ASE-PegasusMEMS manufacturing equipment
Sumitomo Heavy Industries (1)
- Marathon® CPCryopumps
Takatori (1)
- MWS-SiC6Wire saws and wafer slicing equipment
Tazmo (1)
- New MX2000Slurry delivery and recovery systems
TESEC (1)
- 530-ITAnalog test systems
Tokuyama (1)
- 11N polysilicon (semiconductor grade)Polysilicon
Toppan (1)
- FC-BGA substratesPackage substrates (FC-BGA)
Toshiba Electronic Devices & Storage (1)
- QuickOnlineEquipment interfaces (SECS/GEM)
TOWA (1)
- CPM1080Molding (encapsulation) equipment
TOWA LASERFRONT (1)
- SL473 series wafer markersWafer marking and ID readers
ULVAC Cryogenics (1)
- CRYO-U seriesCryopumps
Ushio (1)
- UX-1 seriesMask aligners
VALQUA (1)
- VALQUA ARMORO-rings and seals
Yaskawa Electric (1)
- SEMISTAR-GEKKO VD31HDA-CWafer handling robots
Last updated: October 23, 2026