EUV mask blanks
Mask blanks for EUV lithography made by stacking several metal films on a glass substrate. HOYA says it holds a very high market share in EUV mask blanks.
Maker: HOYA · Official product page
Specifications
| Structure | Glass substrate + multilayer metal films |
|---|---|
| Supported generations | Advanced nodes such as the 3 nm generation |
| In development | Phase shift, High-NA and Hyper-NA support |
| Main customers | Foundries and semiconductor makers |
Specifications as published by the maker. See the sources below.
Overview
HOYA's EUV mask blanks are the material for photomasks used in EUV lithography. They are made by stacking several metal films on a glass substrate. Mask makers write circuit patterns on these blanks to finish them as photomasks.
HOYA says it holds a very high market share in EUV mask blanks and has a track record of contributing to semiconductor scaling. They support advanced nodes such as the 3 nm generation, and development for phase shift types, High-NA and Hyper-NA is under way.
The main customers are foundries and semiconductor makers. In fiscal 2024, sales grew 35% excluding currency effects, driven by recovery from the previous year's inventory adjustment and progress in scaling with EUV.
Key features
- Structure of a glass substrate + multilayer metal films
- Very high market share in EUV mask blanks (per HOYA)
- Phase shift, High-NA and Hyper-NA support in development
Applications
- Manufacturing photomasks for EUV
- EUV lithography for advanced logic and memory
Sources
Last updated: October 23, 2026