Mega™ MFⅦ
Equipment that blends CMP slurry to a consistent concentration and particle size for each liquid type and supplies it centrally. It is made in Japan under license from Kinetics.
Maker: Air Water · Official product page
Specifications
| Supply method | Central blending and supply (local supply for R&D also available) |
|---|---|
| Key feature | Uniform, stable slurry handling; up to 70% lower maintenance cost |
| Main applications | Slurry supply to CMP processes in semiconductor fabs |
Specifications as published by the maker. See the sources below.
Overview
Mega MFⅦ is Air Water Mechatronics' CMP slurry blending and supply system. It blends slurry chemicals and supplies them to CMP equipment in semiconductor fabs and to equipment that polishes substrates such as glass and silicon. It is manufactured in Japan under a license agreement with Kinetics Equipment Group.
CMP slurry is a liquid containing abrasive particles, and settling or agglomeration causes polishing scratches and variation in removal rate. The system's strength is technology that handles slurry uniformly and stably, and it claims stable supply 24 hours a day, 365 days a year, and up to 70% lower maintenance cost.
The lineup includes central supply systems for CMP tools as well as local supply systems for R&D, central supply of ammonium persulfate (APS) powder, pressurized central supply of surfactants, an automatic hydrogen peroxide concentration measurement and replenishment system (ATRS) and a supervisory control and data acquisition system (SCADA).
Key features
- Uniform, stable slurry handling technology
- Stable supply 24 hours a day, 365 days a year
- Up to 70% lower maintenance cost
- Peripheral systems such as automatic H₂O₂ concentration measurement and replenishment, and SCADA
Applications
- Central slurry supply to CMP processes in semiconductor fabs
- Local supply for R&D
Other slurry delivery and recovery systems
- New MX2000 · Tazmo
Sources
Front-end equipment: more products
Last updated: October 23, 2026