New MX2000
Tazmo's system that dilutes, mixes and supplies the various slurries for CMP processes. It uses a pumpless supply method to suppress agglomeration of abrasive particles.
Maker: Tazmo · Official product page
Specifications
| Supply method | Pumpless supply |
|---|---|
| Functions | Dilution, mixing, supply |
| Main applications | Slurry supply to CMP processes |
Specifications as published by the maker. See the sources below.
Overview
New MX2000 is Tazmo's CMP slurry supply system. It dilutes and mixes the slurries used in CMP processes and supplies them centrally to several CMP tools. Tazmo says it has more than 20 years of track record and contributes to high uptime and stable production in many semiconductor fabs.
Its main feature is a proprietary supply method that uses no pumps. Because slurry is moved by vacuum suction and nitrogen gas pressure, agglomeration of abrasive particles caused by pump shear is suppressed. Agglomerated particles cause polishing scratches, so the supply method directly affects CMP yield.
Besides touch panel operation, it has alarm history, barcode management and operating data logging. Tazmo also offers the dual-engine iSIS1200J, with mixing, supply and tank sections in 2 cabinets, and a dissolution and supply system for powdered oxidizer (APS) for metal CMP.
Key features
- Pumpless supply by vacuum suction and nitrogen gas pressure
- Suppresses agglomeration of abrasive particles
- Central supply to several CMP tools
- Alarm history, barcode management and data logging
Applications
- Dilution, mixing and supply of slurry for CMP processes
Other slurry delivery and recovery systems
- Mega™ MFⅦ · Air Water
Sources
Front-end equipment: more products
Last updated: October 23, 2026