ELS-BODEN series

Specifications

Specifications as published by the maker. See the sources below.

Overview

The ELS-BODEN series are ELIONIX's electron beam lithography systems. They have automatic transfer and are installed at many universities and research institutes. Because they write patterns directly with an electron beam, they can form fine patterns from a few nanometers to tens of nanometers without making masks.

According to information published by a research institute, ELS-BODEN-OU4801 has an accelerating voltage of 150 kV, a minimum beam diameter of φ1.5 nm, a minimum line width of 4 nm, a beam current range of 5 pA to 100 nA and writing fields of □100/250/500 µm.

ELS-BODEN100 has an accelerating voltage of 100 kV, beam current of 100 pA to 20 nA, a minimum dot pitch of 0.2 nm, a minimum shot time of 10 ns/dot, field stitching accuracy of 30 nm or less and overlay accuracy of 35 nm or less, and handles samples up to about 8 inch. Depending on configuration, the series covers everything from high-resolution writing to high-current, high-speed writing.

Key features

• Accelerating voltage of 100 to 150 kV (depending on model)
• Minimum line width of 4 nm (published value for OU4801)
• Automatic transfer
• Samples up to about 8 inch (BODEN100)

Applications

• Nanofabrication at universities and research institutes
• Prototyping of optical elements, quantum devices and others

Other electron-beam direct write systems

• JBX-8100FS · JEOL

Sources

1. ELIONIX: product information
2. Osaka University: installed equipment (ELS-BODEN)

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