Polishing pads and carrier parts
GLANZOX
A colloidal silica polishing material for silicon wafers aimed at high flatness and mirror surfaces free of damage and heavy-metal contamination. Introduced in 1967.
Maker: Fujimi Incorporated · Official product page
Specifications
| Types | Polishing material (colloidal silica) |
|---|---|
| Related products | GLANZOX E-Series (for edge polishing) |
| Main applications | Mirror polishing of silicon wafers |
Specifications as published by the maker. See the sources below.
Overview
GLANZOX is Fujimi Incorporated's colloidal silica polishing material for silicon wafers. It was introduced in 1967.
It aims at high flatness and mirror surfaces free of damage and heavy-metal contamination. There is also GLANZOX E-Series for polishing wafer edges.
Key features
- Colloidal silica polishing material
- Mirror surfaces free of damage and heavy-metal contamination
- E-Series for edge polishing
Applications
- Mirror polishing of silicon wafers
Other polishing pads and carrier parts
- IC1000™ series · Nitta DuPont
- Suba™ series · Nitta DuPont
Sources
Polishing pads and carrier parts
Last updated: October 23, 2026