SHX-Ⅲ(HC)
A high-current implanter from a Japanese ion implanter maker. It combines beam scanning and mechanical scanning to keep productivity high at ultra-low energies.
Maker: Sumitomo Heavy Industries Ion Technology · Official product page
Specifications
| Category | High-current ion implanter |
|---|---|
| Beam type | Combination of beam scanning and mechanical scanning |
| Key feature | High productivity at ultra-low energies |
| Energy range | 0.2 to 60 keV |
| Main applications | High-dose, ultra-low-energy implantation |
Specifications as published by the maker. See the sources below.
Overview
SHX-Ⅲ/HC is Sumitomo Heavy Industries Ion Technology's single-wafer high-current ion implanter. The implant energy is 0.2 to 60 keV, and the design emphasizes high productivity at ultra-low energies.
It was the first in the world to combine beam scanning with mechanical scanning, and it carries a newly developed electrostatic scanner for large beams and a parallelizing lens. An energy filter using electrostatic and magnetic fields at the final stage produces a high-purity beam free of energy contamination. It achieves a high 200 eV beam current for volume production that is as free of energy contamination as a drift beam.
Highly accurate implant uniformity across the wafer is corrected by the MIND system, and metal contamination is minimized. It handles 300 mm wafers and is used for next-generation processes at the 20 to 22 nm nodes and for producing leading-edge devices.
Key features
- Implant energy of 0.2 to 60 keV, high productivity at ultra-low energies
- Combination of beam scanning and mechanical scanning
- Final-stage energy filter using electrostatic and magnetic fields
- Non-uniformity correction with the MIND system
Applications
- High-dose, ultra-low-energy implantation for leading-edge devices
- Ultra-shallow junction formation
Also listed under: Beamline ion implanters
More from Sumitomo Heavy Industries Ion Technology
- MC3-Ⅱ(MC) · Medium-current ion implanters
- S-UHE / SS-UHE Ⅱ · High-energy ion implanters
Sources
Front-end equipment: more products
Last updated: October 23, 2026