EXCEED3000AH
The 300 mm wafer model of the EXCEED series, which developed as medium-current implanters with an energy filter. It raises beam current and transfer throughput.
Specifications
| Category | Medium-current ion implanter |
|---|---|
| Wafer size | 300 mm |
| Lineage | Medium-current series since EXCEED2000 (1994) |
| Related models | EXCEED400HY (hydrogen implantation) |
| Main applications | Medium-dose implantation requiring accurate implant angle and energy |
Specifications as published by the maker. See the sources below.
Overview
The EXCEED3000AH series is Nissin Ion Equipment's medium-current ion implanter. It is a high cost-performance model with high productivity and process reliability for nanotechnology nodes, and the maker says it achieves the highest productivity in the industry.
It has a transfer system that handles many substrates, including thin wafers, and delivers more low-energy beam current. The average auto-tune time is short, under 2 minutes, so beams can be set up quickly.
It claims complete removal of energy contamination and carries beam angle feedback systems in both horizontal and vertical directions and a multi-point Faraday system. It is an evolution of the previous model that keeps reliability, process compatibility and parts compatibility.
Key features
- Transfer of many substrates, including thin wafers
- Average auto-tune under 2 minutes
- Horizontal and vertical beam angle feedback, multi-point Faraday
- Process and parts compatibility with the previous model
Applications
- Medium-dose implantation requiring accurate implant angle and energy
- Well formation and threshold adjustment
Also listed under: Beamline ion implanters
Other medium-current ion implanters
More from Nissin Ion Equipment
- IMPHEAT-II · SiC power semiconductor equipment
Sources
Medium-current ion implanters
Last updated: October 23, 2026