PHI GENESIS
The flagship of ULVAC-PHI's multi-technique scanning X-ray photoelectron spectrometers (XPS). Automatic sample exchange allows automated analysis of many samples.
Maker: ULVAC-PHI · Official product page
Specifications
| Analysis technique | XPS (scanning micro X-ray) |
|---|---|
| Key feature | Fully automatic analysis with a robot, automatic neutralization of insulators, depth profiling with cluster ions |
| Main applications | Surface chemical state analysis of metals, semiconductors, ceramics and organics |
Specifications as published by the maker. See the sources below.
Overview
PHI GENESIS is ULVAC-PHI's scanning X-ray photoelectron spectroscopy (XPS) instrument. It measures the energy of photoelectrons emitted when X-rays hit the sample to analyze surface elements and their chemical states. Besides high-performance XPS analysis, its strength is high extensibility.
A range of surface electron spectroscopy analyses can be performed in the same instrument at the same measurement point. It supports hard X-ray photoelectron spectroscopy (HAXPES), ultraviolet photoelectron spectroscopy (UPS), low-energy inverse photoemission spectroscopy and more.
Because an X-ray beam focused to under 5 µm can be scanned over the sample to obtain secondary electron images (SXI), users can move to areas of interest in real time, as with an SEM, and select analysis areas. It is used for surface chemical state analysis of metals, semiconductors, ceramics and organics.
Key features
- XPS with a scanning micro X-ray beam
- Extensible to HAXPES, UPS and low-energy inverse photoemission
- Several techniques at the same measurement point
- Area selection with X-ray-induced secondary electron images (SXI)
Applications
- Surface chemical state analysis of semiconductors and materials
- Depth profiling of interfaces and thin films
Other surface analysis instruments (xps/sims)
- JAMP-9510F · JEOL
- TXRF 3760 · Rigaku
- KRATOS ULTRA2 (AXIS Supra+) · Shimadzu
All surface analysis instruments (xps/sims) and Japanese suppliers
More from ULVAC-PHI
- PHI nanoTOF 3+ · Contamination analysis equipment
Sources
Surface analysis instruments (XPS/SIMS)
Last updated: October 23, 2026