Surface analysis instruments (XPS/SIMS)
Surface analysis instruments determine the elements and chemical states in the outermost few nanometers of a sample. XPS measures photoelectrons excited by X-rays, AES measures Auger electrons, and TOF-SIMS measures secondary ions with very high sensitivity.
What it does
They are used to analyze contamination, interfaces and thin films, often with depth profiling by ion sputtering.
Products (4)
- JAMP-9510F · JEOL
An Auger microprobe with a hemispherical analyzer and a Schottky field emission electron gun. It analyzes chemical bonding states in nano to micro areas.
- TXRF 3760 · Rigaku
A total reflection X-ray fluorescence spectrometer that measures surface contamination on wafers up to 200 mm. It is used for contamination control in every process, including cleaning, lithography and etching.
- KRATOS ULTRA2 (AXIS Supra+) · Shimadzu
An X-ray photoelectron spectrometer optimized for chemical state analysis. It has dedicated analyzers for imaging and for spectroscopy.
- PHI GENESIS · ULVAC-PHI
The flagship of ULVAC-PHI's multi-technique scanning X-ray photoelectron spectrometers (XPS). Automatic sample exchange allows automated analysis of many samples.
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Surface analysis instruments (XPS/SIMS)
Last updated: October 23, 2026