TXRF 3760
A total reflection X-ray fluorescence spectrometer that measures surface contamination on wafers up to 200 mm. It is used for contamination control in every process, including cleaning, lithography and etching.
Maker: Rigaku · Official product page
Specifications
| Analysis technique | TXRF (total reflection X-ray fluorescence) |
|---|---|
| Key feature | Measures Na to U, detector needs no liquid nitrogen, zero edge exclusion (optional) |
| Main applications | Metal contamination analysis of wafer surfaces |
Specifications as published by the maker. See the sources below.
Overview
TXRF 3760 is Rigaku's total reflection X-ray fluorescence (TXRF) spectrometer. It irradiates the wafer surface with X-rays at a very shallow angle so that they are totally reflected, measuring trace metal contamination on the surface non-destructively and quickly. It handles wafers of 200 mm and below and small substrates.
An X-ray system that takes 3 beams from 1 target measures elements from sodium (Na) to uranium (U). Detection limits (E10 atoms/cm²) are 25 for Na and Al, 0.1 for Fe and Ni, and 0.15 for Cu. It has a 9 kW rotating-anode W target X-ray source and uses 3 excitation energies optimized for different groups of elements.
It has an XYθ stage to avoid diffraction, robotic wafer transfer in vacuum and an electronically cooled detector that needs no liquid nitrogen. Sweeping TXRF, which maps contamination over the whole wafer, and ZEE-TXRF, which measures up to the edge, are options. It is used to analyze contamination in each process, including cleaning, lithography, etching, ashing and deposition, and handles Si and non-Si substrates.
Key features
- Measures surface metal contamination from Na to U by TXRF
- Detection limit of 0.1×10¹⁰ atoms/cm² for Fe and Ni
- 9 kW rotating anode, 3 excitation energies
- Sweeping TXRF and ZEE-TXRF (optional)
Applications
- Metal contamination analysis of wafer surfaces
- Contamination control in cleaning, etching and deposition
Other surface analysis instruments (xps/sims)
- JAMP-9510F · JEOL
- KRATOS ULTRA2 (AXIS Supra+) · Shimadzu
- PHI GENESIS · ULVAC-PHI
All surface analysis instruments (xps/sims) and Japanese suppliers
More from Rigaku
- Thermo plus EVO2 TG-DTA series · Thermal analysis instruments (TG-DTA/DSC)
- WaferX 310 · Film composition analysis (XRF/FTIR)
Sources
Surface analysis instruments (XPS/SIMS)
Last updated: October 23, 2026