MASK MVM-SEM® E3640
An MVM-SEM for the 1X nm node that accurately measures fine pattern dimensions on masks and patterned media.
Maker: Advantest · Official product page
Specifications
| Target | Photomasks, EUV masks, NIL templates |
|---|---|
| Supported nodes | 1X nm |
| Functions | Simulated exposure, EDA integration, real-time 3D observation |
Specifications as published by the maker. See the sources below.
Overview
E3640 is Advantest's MASK MVM-SEM. It accurately measures fine pattern dimensions on masks and patterned media. It is a model in the E3600 series, which is widely used in the mask SEM market.
Greatly improved measurement repeatability and throughput let it support 1X nm node processes. Besides photomasks for today's mainstream lithography, it can be used for EUV masks and nanoimprint (NIL) templates.
It supports simulated exposure and works with EDA tools to measure hotspots more accurately. Real-time 3D observation and 3D metrology are also possible.
Key features
- Supports the 1X nm node
- Handles EUV masks and NIL templates
- EDA integration and 3D metrology
Applications
- Dimension measurement of photomasks
Other mask dimension and flatness metrology
- MASK CD-SEM E3660 · Advantest
- MASK MVM-SEM® E3650 · Advantest
- MPM193 series · Lasertec
- MPM248 · Lasertec
- DR-8000 · SCREEN Holdings
All mask dimension and flatness metrology and Japanese suppliers
More from Advantest
- 7038 System-Level Test System · Final test equipment
- B6700 series · Burn-in systems
- EVA100 · Analog test systems
- EXAVIS · Power semiconductor manufacturing equipment
- H5620 · Memory test systems
- HA1200 · Wafer probers
- HA7200 · MEMS manufacturing equipment
- HA7300 · MEMS manufacturing equipment
Sources
Mask dimension and flatness metrology
Last updated: October 23, 2026