Mask dimension and flatness metrology
Mask metrology equipment measures the dimensions, placement and shape of patterns on photomasks. Because every wafer exposed through a mask copies its errors, mask patterns have to be measured to a fraction of the tolerance allowed on the wafer.
What it does
CD-SEMs built for masks measure line widths and contours, including on EUV masks and nanoimprint templates, and are increasingly driven by design data to handle the many measurement points of advanced masks.
Products (6)
- MASK CD-SEM E3660 · Advantest
A CD-SEM for photomasks for nodes below 2 nm. Measurement accuracy is more than 20% better than the previous E3650.
- MASK MVM-SEM® E3640 · Advantest
An MVM-SEM for the 1X nm node that accurately measures fine pattern dimensions on masks and patterned media.
- MASK MVM-SEM® E3650 · Advantest
A multi-vision metrology SEM for photomasks in the E3600 series. Measurement throughput is twice that of the previous E3640.
- MPM193 series · Lasertec
The industry-standard phase shift measurement system for ArF. It measures phase difference and transmittance directly at 193 nm, the same wavelength as exposure.
- MPM248 · Lasertec
The industry-standard phase shift measurement system for KrF. It measures phase difference and transmittance at 248 nm.
- DR-8000 · SCREEN Holdings
A system that measures photomask line widths (CD) with nanometer-level repeatability using a high-resolution UV microscope. It can also measure transmittance and phase shift.
Japanese makers in this category
- Advantest · 3 product(s) listed
- Lasertec · 2 product(s) listed
- SCREEN Holdings · 1 product(s) listed
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Mask dimension and flatness metrology
Last updated: October 23, 2026