MASK MVM-SEM® E3650
A multi-vision metrology SEM for photomasks in the E3600 series. Measurement throughput is twice that of the previous E3640.
Maker: Advantest · Official product page
Specifications
| Measurement method | Mask CD-SEM (multi-dimensional observation and measurement) |
|---|---|
| Target masks | Advanced photomasks, EUV masks, NIL templates |
| Related models | E3660 (for 2 nm and beyond, 2025) |
| Main applications | Measuring mask pattern dimensions and contours |
Specifications as published by the maker. See the sources below.
Overview
MASK MVM-SEM E3650 is Advantest's CD-SEM (critical dimension measurement system) for photomasks. Its own electron beam scanning technology measures pattern dimensions on photomasks with high accuracy and stability.
It targets photomasks for sub-10 nm node devices, EUV masks and master templates for nanoimprint. It supports CD measurement of fine patterns, optimized MAM (Move Acquire Measure) time, large field-of-view measurement, DBM (Design Based Metrology) using design data, and 3D observation.
Measurement throughput is twice that of the previous E3640, and measurement repeatability and long-term CD stability are also improved. It is designed to handle the larger number of masks and measurement points that come with multi-patterning and scaling, and is the latest model in the widely used E3600 series.
Key features
- CD measurement of EUV masks and NIL templates
- Twice the measurement throughput of the previous E3640
- DBM (design-based metrology), 3D observation and large field-of-view measurement
Applications
- Dimension measurement of advanced photomasks and EUV masks
- Measurement of nanoimprint templates
Other mask dimension and flatness metrology
- MASK CD-SEM E3660 · Advantest
- MASK MVM-SEM® E3640 · Advantest
- MPM193 series · Lasertec
- MPM248 · Lasertec
- DR-8000 · SCREEN Holdings
All mask dimension and flatness metrology and Japanese suppliers
More from Advantest
- 7038 System-Level Test System · Final test equipment
- B6700 series · Burn-in systems
- EVA100 · Analog test systems
- EXAVIS · Power semiconductor manufacturing equipment
- H5620 · Memory test systems
- HA1200 · Wafer probers
- HA7200 · MEMS manufacturing equipment
- HA7300 · MEMS manufacturing equipment
Sources
Mask dimension and flatness metrology
Last updated: October 23, 2026