DR-8000
A system that measures photomask line widths (CD) with nanometer-level repeatability using a high-resolution UV microscope. It can also measure transmittance and phase shift.
Maker: SCREEN Holdings · Official product page
Specifications
| Type | High-resolution UV microscope |
|---|---|
| Measurements | CD, aerial image, transmittance (repeatability 0.1% or less), phase shift |
| Target | 4 to 9-inch masks, large FPD masks (G6 to G10) |
Specifications as published by the maker. See the sources below.
Overview
DR-8000 is SCREEN's automatic line width measurement system for photomask quality control. With a high-resolution UV microscope, it measures the line width (CD) of fine patterns with high, nanometer-level repeatability. It has a long track record as standard equipment in the photomask industry.
A UV objective lens dedicated to CD measurement, uniform UV transmitted illumination, an edge detection algorithm and SCREEN's own focus system accurately measure isolated lines, L&S, holes and dots, resist patterns and more.
It also supports observation of aerial images with NA and illumination σ controlled at the exposure wavelength, phase shift measurement with SCREEN's own double-slit method, and transmittance measurement with repeatability of 0.1% or less. High-resolution review based on coordinates from defect inspection systems and measurement of pellicle-mounted masks are also possible. It handles 4 to 9-inch masks for semiconductors and G6 to G10 masks for large panels.
Key features
- Nanometer-level CD repeatability
- Measures aerial images, phase shift and transmittance
- Supports pellicle-mounted masks
Applications
- Photomask development and quality assurance
- Measurement of large masks for FPDs
Other mask dimension and flatness metrology
- MASK CD-SEM E3660 · Advantest
- MASK MVM-SEM® E3640 · Advantest
- MASK MVM-SEM® E3650 · Advantest
- MPM193 series · Lasertec
- MPM248 · Lasertec
All mask dimension and flatness metrology and Japanese suppliers
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Sources
Mask dimension and flatness metrology
Last updated: October 23, 2026