LPCVD equipment

AdvancedAce®-II

KOKUSAI ELECTRIC's large-batch vertical thermal process system. Core technologies in temperature control, transfer and vacuum and gas replacement shorten cycle time.

Maker: Kokusai Electric · Official product page

Specifications


TypeLarge-batch vertical furnace
Wafer size300 mm
ProcessesCVD, oxidation, diffusion, annealing
Main applicationsThermal CVD and heat treatment on volume production lines

Specifications as published by the maker. See the sources below.

Overview


AdvancedAce-II is KOKUSAI ELECTRIC's large-batch thermal process system for 300 mm wafers. It brings together the company's core technologies in temperature control, automated transfer, vacuum and gas replacement, cooling and deposition, dramatically shortening cycle time for high throughput.

As a deposition system it is used to form CVD films and oxide films by LP-CVD, and as a treatment system for oxidation, diffusion and low- and high-temperature annealing. Lot capacity is up to 1.75 times that of KOKUSAI's earlier tool, the highest productivity in its large-batch line.

Its strengths are uniform film formation in deep trench structures and accurate, high-quality deposition at low temperature. A health check function is available as an option.

Key features


Applications


Other lpcvd equipment


More from Kokusai Electric


Sources


  1. KOKUSAI ELECTRIC: products and services

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Last updated: October 23, 2026