Advanced TSURUGI Plus-Ⅲ
KOKUSAI ELECTRIC's top deposition system model. A mini-batch thermal process system that combines difficult deposition on 3D stacked devices with high productivity.
Maker: Kokusai Electric · Official product page
Specifications
| Type | Mini-batch thermal process (thin film formation) |
|---|---|
| Wafer size | 300 mm |
| Key feature | High-performance wafer reactor, high-performance gas supply and exhaust, health check function (optional) |
Specifications as published by the maker. See the sources below.
Overview
Advanced TSURUGI Plus-Ⅲ is the top model of KOKUSAI ELECTRIC's deposition systems. It is a mini-batch thermal process system for the generation after next of devices, whose structures keep getting finer and more complex, combining difficult deposition with high productivity.
New technology achieves difficult deposition on 3D stacked devices, where the surface area to be coated grows further and structures become more complex. A high-performance wafer reactor with a unique structure reduces the loading effect and improves thickness uniformity, and higher replacement efficiency of reactant gases shortens deposition time.
It has high-performance gas supply and exhaust systems, low-particle, high-speed wafer transfer, high productivity and a small footprint. A new controller and control method increase capacity and speed, and a health check function that collects tool data and monitors operation is available as an option.
Key features
- Top model among the deposition systems
- Wafer reactor with a unique structure
- High-performance gas supply and exhaust
- Health check function (optional)
Applications
- Thin film formation for 3D stacked devices
- Memory and logic for the generation after next
Other ald equipment
- Advanced TSURUGI · Kokusai Electric
- TSURUGI-C²® · Kokusai Electric
- NT333™ · Tokyo Electron (TEL)
- TELINDY PLUS™ IRad™ · Tokyo Electron (TEL)
More from Kokusai Electric
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- MARORA® · Rapid thermal processing (RTP) equipment
- QUIXACE®-II · CVD equipment
- QUIXACE®-LV · Epitaxial growth equipment
- TANDUO · Rapid thermal processing (RTP) equipment
- VERTEX Revolution · Oxidation furnaces
- VR300DH3 · Sheet resistance measurement
Sources
Last updated: October 23, 2026