TANDUO
KOKUSAI ELECTRIC's single-wafer thermal process system. Annealing and thin film formation can be selected in a modular configuration, handling short processes that batch furnaces struggle with.
Maker: Kokusai Electric · Official product page
Specifications
| Type | Single wafer |
|---|---|
| Supported processes | Annealing, thin film formation |
| Configuration | Modular selection |
| Related models | MARORA (plasma nitridation, plasma oxidation) |
| Main applications | Single-wafer heat treatment and film quality improvement |
Specifications as published by the maker. See the sources below.
Overview
TANDUO is KOKUSAI ELECTRIC's single-wafer treatment (film quality improvement) system for 300 mm wafers. It handles the step of heating deposited thin films to remove impurities and improve film quality.
Modules are chosen according to the process, so an optimal system can be built for curing, annealing, degassing and more. Combined with KOKUSAI's own high-speed transfer system it achieves high throughput, and its own susceptor heater controls temperature across the wafer with high uniformity.
Its strengths are low contamination, a small footprint and high uptime, and it has a worldwide sales record as a high-throughput single-wafer anneal system. The same single-wafer treatment line includes MARORA, which performs nitridation and oxidation with low-electron-temperature plasma using the MMT method.
Key features
- Modules chosen for curing, annealing and degassing
- High throughput with KOKUSAI's own high-speed transfer system
- Highly uniform in-wafer temperature control with a susceptor heater
- Low contamination, small footprint, high uptime
Applications
- Single-wafer annealing (low and high temperature)
- Film curing and degassing
Other rapid thermal processing (rtp) equipment
- MARORA® · Kokusai Electric
- Triase+™ SPAi · Tokyo Electron (TEL)
All rapid thermal processing (rtp) equipment and Japanese suppliers
More from Kokusai Electric
- Advanced TSURUGI · ALD equipment
- Advanced TSURUGI Plus-Ⅲ · ALD equipment
- AdvancedAce®-II · LPCVD equipment
- QUIXACE®-II · CVD equipment
- QUIXACE®-LV · Epitaxial growth equipment
- TSURUGI-C²® · ALD equipment
- VERTEX Revolution · Oxidation furnaces
- VR300DH3 · Sheet resistance measurement
Sources
Rapid thermal processing (RTP) equipment
Last updated: October 23, 2026