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QUIXACE®-II

KOKUSAI ELECTRIC's 300 mm large-batch thermal process system. Core technologies in temperature control, transfer, vacuum and gas replacement, and cooling shorten cycle time.

Maker: Kokusai Electric · Official product page

Specifications

Wafer size300 mm
TypeLarge-batch vertical furnace
ProcessesCVD and oxide film formation; oxidation, diffusion and annealing
Key featureUp to 1.25 times the lot capacity (vs. KOKUSAI's earlier tool), uniform deposition in deep trenches

Specifications as published by the maker. See the sources below.

Overview

QUIXACE-II is KOKUSAI ELECTRIC's large-batch thermal process system for 300 mm wafers. It brings together the company's core technologies in temperature control, automated transfer, vacuum and gas replacement, cooling and deposition, greatly shortening cycle time for high throughput.

As a deposition system it is used to form CVD films and oxide films, and as a treatment (film quality improvement) system for oxidation, diffusion and low- and high-temperature annealing. Lot capacity is up to 1.25 times that of KOKUSAI's earlier tool.

Its strengths are uniform deposition in deep trench structures and accurate, high-quality deposition at low temperature, and a health check function is available as an option. The same large-batch line includes AdvancedAce-II, with up to 1.75 times the lot capacity, and QUIXACE-LV for EPI with a vacuum load lock.

Key features

Applications

Also listed under: Diffusion furnaces, Annealing furnaces

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More from Kokusai Electric

Sources

  1. KOKUSAI ELECTRIC: products and services

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Last updated: October 23, 2026