Rapid thermal processing (RTP) equipment

MARORA®

Name: MARORA
Brand: Kokusai Electric

A single-wafer treatment system that produces low-electron-temperature plasma of about 1 eV with KOKUSAI's own MMT method. It is used for plasma nitridation and oxidation of gate dielectrics.

Maker: Kokusai Electric · Official product page

Specifications

Type	Single-wafer plasma treatment (MMT method, about 1 eV)
Wafer size	300 mm
Main applications	Plasma nitridation, plasma oxidation, selective oxidation

Specifications as published by the maker. See the sources below.

Overview

MARORA is KOKUSAI ELECTRIC's single-wafer treatment (film quality improvement) system. It is suited to forming gate dielectrics for next-generation DRAM and logic and insulating films for flash memory.

KOKUSAI's own plasma generation method, MMT (Modified Magnetron Typed), efficiently produces plasma with a low electron temperature of about 1 eV, achieving processing without plasma damage. Plasma uniformity at the substrate surface has also been improved.

It has up to twice the productivity of the earlier model and a high-temperature heater that controls temperature over a wide range. Besides plasma oxidation and plasma nitridation, it can perform selective oxidation, which oxidizes only silicon without oxidizing metals.

Key features

Low-electron-temperature plasma by the MMT method (about 1 eV)
No plasma damage
Up to twice the productivity of the earlier model
Supports selective oxidation

Applications

Gate dielectrics for DRAM and logic
Insulating films for flash memory

Other rapid thermal processing (rtp) equipment

TANDUO · Kokusai Electric
Triase+™ SPAi · Tokyo Electron (TEL)

All rapid thermal processing (rtp) equipment and Japanese suppliers

Sources

KOKUSAI ELECTRIC: products and services