VF-1000H
A compact vertical furnace from JTEKT Thermo Systems that supports high-temperature processing for SiC wafers.
Maker: Koyo Thermo Systems (JTEKT Thermo Systems) · Official product page
Specifications
| Type | Mini-batch vertical furnace for R&D (25 wafers) |
|---|---|
| Wafer size | Up to 150 mm |
| Processes | High-temperature oxidation and oxynitridation (MoSi₂ 700 to 1,400 °C / carbon 700 to 1,850 °C) |
| Main applications | SiC power devices |
Specifications as published by the maker. See the sources below.
Overview
VF-1000H is a mini-batch vertical furnace for R&D from JTEKT Thermo Systems (formerly Koyo Thermo Systems). It processes up to 25 wafers with single-wafer transfer, delivering high-quality processes even though it is for R&D.
There are 2 heater types: molybdenum disilicide (MoSi₂) and carbon. The temperature range is 700 to 1,400 °C for the MoSi₂ heater and 700 to 1,850 °C for the carbon heater, higher than typical diffusion furnaces for silicon.
The MoSi₂ heater version handles wafers up to φ150 mm and supports several wafer sizes. The main processes are high-temperature oxidation and oxynitridation. The main unit measures 1,800 (W) × 1,400 (D) × 2,300 (H) mm.
Key features
- Mini-batch vertical furnace for R&D (25 wafers)
- MoSi₂ heater 700 to 1,400 °C / carbon heater 700 to 1,850 °C
- Supports several wafer sizes (up to φ150 mm)
Applications
- R&D in high-temperature oxidation and oxynitridation
- Evaluating high-temperature heat treatment of wide-bandgap materials such as SiC
Other annealing furnaces
- QUIXACE®-II · Kokusai Electric
More from Koyo Thermo Systems (JTEKT Thermo Systems)
Sources
Front-end equipment: more products
Last updated: October 23, 2026