VF-5300H
JTEKT Thermo Systems' vertical furnace for high-temperature oxidation and oxynitridation of SiC power devices.
Maker: Koyo Thermo Systems (JTEKT Thermo Systems) · Official product page
Specifications
| Type | Stocker-type vertical furnace (75 wafers) |
|---|---|
| Wafer size | 150 to 200 mm |
| Processes | High-temperature oxidation, oxynitridation |
| Main applications | Gate oxidation of SiC power devices |
Specifications as published by the maker. See the sources below.
Overview
VF-5300H is a stocker-type vertical furnace for volume production from JTEKT Thermo Systems (formerly Koyo Thermo Systems). It handles φ150 to 200 mm wafers and processes 75 wafers per run.
Transfer combines robots that move 5 wafers at once and single wafers. The heater is molybdenum disilicide (MoSi₂), with a temperature range of 700 to 1,400 °C, higher than typical oxidation furnaces for silicon.
The main processes are high-temperature oxidation and oxynitridation, and a highly airtight chamber structure also supports SiC wafers. It suits steps that need high-temperature oxidation, such as forming the gate oxide of SiC power devices. The main unit measures 900 (W) × 2,300 (D) × 3,300 (H) mm.
Key features
- Stocker-type vertical furnace for volume production (75 wafers)
- MoSi₂ heater, 700 to 1,400 °C
- Highly airtight chamber structure, supports SiC wafers
Applications
- Gate oxidation of SiC power devices
- High-temperature oxidation and oxynitridation
Other oxidation furnaces
- VERTEX Revolution · Kokusai Electric
- TELINDY PLUS · Tokyo Electron (TEL)
More from Koyo Thermo Systems (JTEKT Thermo Systems)
Sources
Front-end equipment: more products
Last updated: October 23, 2026