VERTEX Revolution
A batch vertical thermal process system for 200 mm that adopts 300 mm design concepts. It also handles wafers of 150 mm and smaller.
Maker: Kokusai Electric · Official product page
Specifications
| Type | Batch vertical furnace (175-wafer large-capacity furnace option) |
|---|---|
| Wafer size | 200 mm (also 150 mm and smaller) |
| Processes | Oxidation, diffusion, ultra-high-temperature annealing, CVD |
| Main applications | Thermal oxidation and heat treatment on 200 mm lines |
Specifications as published by the maker. See the sources below.
Overview
VERTEX Revolution is KOKUSAI ELECTRIC's batch thermal process system for 200 mm wafers. It is the latest version of the best-selling VERTEX series, which has an extensive delivery record, and models can be chosen to fit needs from high-mix, low-volume lines to mass production lines. It also handles wafers of 150 mm and smaller.
It keeps process compatibility with the existing VERTEX series while adopting the latest 300 mm tool designs to raise processing speed. Options include a high-productivity furnace that processes 175 wafers and a furnace for low ceilings that processes 100 wafers.
Atmosphere control for processes sensitive to oxygen concentration and humidity in the air is also available as an option, and the controller has been renewed with the latest architecture to raise processing performance and eliminate discontinuation risk. Applications are CVD and oxide film formation, oxidation, diffusion and annealing from low to ultra-high temperatures.
Key features
- Process compatibility with the VERTEX series
- 175-wafer high-productivity furnace / 100-wafer low-ceiling furnace (optional)
- Atmosphere control option
- Controller with the latest architecture
Applications
- Oxidation and diffusion on 200 mm lines
- CVD film formation and annealing from low to ultra-high temperatures
Other oxidation furnaces
- VF-5300H · Koyo Thermo Systems (JTEKT Thermo Systems)
- TELINDY PLUS · Tokyo Electron (TEL)
More from Kokusai Electric
- Advanced TSURUGI · ALD equipment
- Advanced TSURUGI Plus-Ⅲ · ALD equipment
- AdvancedAce®-II · LPCVD equipment
- MARORA® · Rapid thermal processing (RTP) equipment
- QUIXACE®-II · CVD equipment
- QUIXACE®-LV · Epitaxial growth equipment
- TANDUO · Rapid thermal processing (RTP) equipment
- TSURUGI-C²® · ALD equipment
Sources
Front-end equipment: more products
Last updated: October 23, 2026