MBM-3000
A multi-beam mask writer for the 2 nm node. A next-generation blanking aperture array doubles the number of beams compared with the previous model.
Maker: NuFlare Technology · Official product page
Specifications
| Writing method | Multiple electron beams |
|---|---|
| Generation | 2 nm node |
| Key feature | 12 nm beamlets, current density 3.6 A/cm² |
| Related models | MBM-2000PLUS (previous model) |
| Main applications | Writing advanced photomasks |
Specifications as published by the maker. See the sources below.
Overview
MBM-3000 is NuFlare Technology's multi-beam mask writer. By writing patterns on photomasks with many electron beams at once, it raises productivity for advanced EUV masks, whose writing times tend to be long.
According to published presentation material, it carries 12 nm beamlets and a powerful cathode to achieve a beam current density of 3.6 A/cm², giving higher resolution and faster writing than the previous MBM-2000PLUS. The new optics use a next-generation blanking aperture array (BAA) that doubles the number of beams.
NuFlare's multi-beam writers also include MBM-2000PLUS and MBM-2000 for the 3 nm+ node, which control more than 260,000 electron beams quickly and accurately, and it also offers the EBM series of variable shaped beam writers, such as EBM-9500PLUS.
Key features
- Writing with multiple electron beams
- 12 nm beamlets, current density of 3.6 A/cm²
- Next-generation BAA doubles the number of beams
Applications
- Writing next-generation EUV masks
Other electron-beam mask writers
- JBX-3200MVS · JEOL
Sources
Front-end equipment: more products
Last updated: October 23, 2026