Laser annealing equipment

LA-3100

SCREEN's millisecond anneal system that heats and cools the wafer surface with flashes of a few milliseconds from xenon flash lamps. It achieves high dopant activation with a low thermal budget.

Maker: SCREEN Holdings · Official product page

Specifications


Heating methodXenon flash lamps (millisecond)
AtmosphereSingle-wafer processing, low-oxygen atmosphere
Key featureMeasures wafer temperature during flash heating
Main applicationsDopant activation in source/drain

Specifications as published by the maker. See the sources below.

Overview


LA-3100 is a flash lamp anneal system from SCREEN Semiconductor Solutions. It irradiates the wafer with light lasting a few milliseconds from xenon flash lamps, raising and lowering the wafer surface temperature very quickly.

Because it anneals with a low thermal budget (thermal history), it can highly activate the dopants implanted in source and drain while precisely controlling their concentration profiles. It is positioned as a tool that contributes greatly to improving the characteristics of leading-edge devices.

Because it processes wafers one at a time, it can anneal in a strictly controlled low-oxygen atmosphere. While applying millisecond-controlled heat treatment across the whole wafer, it can also measure wafer temperature during flash heating, making it easier to understand and explain temperature-related physical phenomena from the R&D stage.

Key features


Applications


More from SCREEN Holdings


Sources


  1. SCREEN: LA-3100 product page

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Last updated: October 23, 2026