FC-821L
A space-saving batch cleaning system with half-pitch transfer and one-bath processing.
Maker: SCREEN Holdings · Official product page
Specifications
| Type | Batch (half pitch, one bath) |
|---|---|
| Key feature | 5 chemicals usable in one tank, chemical circulation bath (CHB) |
| Drying | Reduced-pressure drying, watermark-free |
Specifications as published by the maker. See the sources below.
Overview
FC-821L is SCREEN's space-saving batch cleaning system (wet station). Half-pitch transfer, which carries wafers at half the usual spacing, allows smaller process tanks and reduces chemical and pure water use.
A chemical circulation bath (CHB) allows hot and high-concentration chemicals, covering a wide range of cleaning processes.
One-bath processing, which performs chemical treatment and rinsing in a single tank, keeps even the inside of fine patterns wet throughout cleaning, and because wafers are not exposed to air during processing, native oxide growth is suppressed. Up to 5 chemicals can be used in one tank. A reduced-pressure dryer also prevents watermarks.
Key features
- Space-saving half-pitch transfer
- One-bath processing (5 chemicals in one tank)
- Suppresses native oxide growth
- Reduced-pressure drying
Applications
- Batch cleaning of fine patterns
Other batch wafer cleaning equipment
- CW-2000 · SCREEN Holdings
- FC-3100 · SCREEN Holdings
- WS-620C / WS-820C / WS-820L · SCREEN Holdings
- ZETA™+ · Tokyo Electron (TEL)
More from SCREEN Holdings
- DR-8000 · Mask dimension and flatness metrology
- DT-3000 (SOKUDO DUO) · Coater/developers
- DW-3100 · Laser direct imaging systems
- LA-3100 · Laser annealing equipment
- RE-3500 · Ellipsometers
- RF-200EX / RF-300EX · Coater/developers
- SB-3300 · Wafer scrubbers
- SC-80EX · Coater/developers
Sources
Batch wafer cleaning equipment
Last updated: October 23, 2026