CW-2000
A compact batch cleaning system with about 45% less footprint and 1.5 times the productivity. It handles 50 to 200 mm wafers.
Maker: SCREEN Holdings · Official product page
Specifications
| Wafer size | 50 to 200 mm |
|---|---|
| Capacity | 150 wafers per hour (1.5 times the previous model) |
| Drying | DIS drying, hot blow drying (HBD) |
Specifications as published by the maker. See the sources below.
Overview
CW-2000 is SCREEN's compact wet station. Its all-in-one design places the chemical supply unit and cooling unit inside the main unit, saving about 45% of floor space compared with SCREEN's earlier tool.
One tool handles a wide range of wafer sizes from 50 mm to 200 mm. Process tanks can be expanded to 4, 6 or 8, and productivity is 150 wafers per hour, 1.5 times the previous model.
Besides conventional DIS (Drain & IPA Substitution) drying, users can choose environmentally friendly hot blow drying (HBD), which uses no IPA. It also supports RCA cleaning, which helps improve yield.
Key features
- About 45% less floor space
- Handles 50 to 200 mm
- 150 wafers per hour
- Hot blow drying without IPA
Applications
- Batch cleaning of small-diameter wafers
- RCA cleaning
Other batch wafer cleaning equipment
- FC-3100 · SCREEN Holdings
- FC-821L · SCREEN Holdings
- WS-620C / WS-820C / WS-820L · SCREEN Holdings
- ZETA™+ · Tokyo Electron (TEL)
More from SCREEN Holdings
- DR-8000 · Mask dimension and flatness metrology
- DT-3000 (SOKUDO DUO) · Coater/developers
- DW-3100 · Laser direct imaging systems
- LA-3100 · Laser annealing equipment
- RE-3500 · Ellipsometers
- RF-200EX / RF-300EX · Coater/developers
- SB-3300 · Wafer scrubbers
- SC-80EX · Coater/developers
Sources
Batch wafer cleaning equipment
Last updated: October 23, 2026