Batch wafer cleaning equipment

FC-3100

Name: FC-3100
Brand: SCREEN Holdings

SCREEN's batch wet station. Fast transfer and buffer modules process 1,000 wafers per hour, and the HiLPD reduced-pressure drying system suppresses watermarks and pattern collapse.

Maker: SCREEN Holdings · Official product page

Specifications

Type	Batch wet station
Throughput	1,000 wafers per hour
Configuration	7 independent modules (2 cleaning tanks per module)
Key technologies	HiLPD reduced-pressure drying system (high-concentration IPA)

Specifications as published by the maker. See the sources below.

Overview

FC-3100 is a batch wet station from SCREEN Semiconductor Solutions. It cleans wafers by immersing them in chemical tanks together with their carrier, and a high-throughput buffer module and high-speed transfer module give high productivity of 1,000 wafers per hour.

For reliability, it uses a simple structure in which the tool is divided into 7 independent modules that are combined. Each module has a standardized, independent structure, and the compact design with 2 cleaning tanks per module allows smooth assembly, adjustment, inspection and installation.

For drying, it has the HiLPD reduced-pressure drying system. Because it can supply high-concentration IPA without carrier N₂, it greatly suppresses watermarks. Quickly lowering surface tension with high-concentration IPA also prevents pattern collapse.

Key features

High throughput of 1,000 wafers per hour
Simple, reliable structure of 7 independent modules
HiLPD reduced-pressure drying (high-concentration IPA) suppresses watermarks and pattern collapse

Applications

Batch wet cleaning and etching
Pre- and post-process cleaning on volume lines

Other batch wafer cleaning equipment

CW-2000 · SCREEN Holdings
FC-821L · SCREEN Holdings
WS-620C / WS-820C / WS-820L · SCREEN Holdings
ZETA™+ · Tokyo Electron (TEL)

All batch wafer cleaning equipment and Japanese suppliers

Sources

SCREEN: FC-3100 product page