SU-3400
SCREEN's single-wafer cleaning system that carries on the cleaning performance of the SU series. Raising the sulfuric acid temperature at the wafer surface reduces SPM use.
Maker: SCREEN Holdings · Official product page
Specifications
| Processing method | Single-wafer wet (SPM and others) |
|---|---|
| Wafer size | 300 mm |
| Key feature | 1,200 wafers per hour, 30% less SPM use |
| Main applications | Resist stripping and cleaning |
Specifications as published by the maker. See the sources below.
Overview
SU-3400 is SCREEN's single-wafer cleaning system. It is the latest model in the SU series, which SCREEN has developed since 1983, and aims at optimal processing of the gas-liquid interface on the wafer surface.
With 6 levels and 4 towers, it carries up to 24 chambers and has a capacity of 1,200 wafers per hour. Footprint is 30% smaller than the previous SU-3300. Raising the temperature of the sulfuric acid at the wafer surface reduces SPM chemical use.
Optimized exhaust and chemical use cut environmental impact by 20%, and it is certified as a SCREEN Super Green Product. It also supports high-resolution video monitoring inside the chambers, IoT-based anomaly detection and maintenance chamber by chamber.
Key features
- Up to 24 chambers (6 levels, 4 towers)
- Capacity of 1,200 wafers per hour
- 30% smaller footprint than the previous model
- Less SPM use and 20% lower environmental impact
Applications
- Resist stripping (SPM)
- Single-wafer cleaning of 300 mm wafers
Other wet resist strip equipment
- CELLESTA™ Pro SPM · Tokyo Electron (TEL)
More from SCREEN Holdings
- CW-2000 · Batch wafer cleaning equipment
- DR-8000 · Mask dimension and flatness metrology
- DT-3000 (SOKUDO DUO) · Coater/developers
- DW-3100 · Laser direct imaging systems
- FC-3100 · Batch wafer cleaning equipment
- FC-821L · Batch wafer cleaning equipment
- LA-3100 · Laser annealing equipment
- RE-3500 · Ellipsometers
Sources
Front-end equipment: more products
Last updated: October 23, 2026