MASK DR-SEM E5620
A defect review SEM that reviews and classifies tiny defects on photomasks. It automatically images the defect locations found by mask inspection systems.
Maker: Advantest · Official product page
Specifications
| Target | 6025-size photomasks |
|---|---|
| SEM spatial resolution | 2 nm |
| Options | Elemental analysis (EDS, 127 eV), backscattered electron analysis |
Specifications as published by the maker. See the sources below.
Overview
E5620 is Advantest's MASK DR-SEM (scanning electron microscope for defect review). It reviews and classifies tiny defects on photomasks.
With highly stable image acquisition technology, it automatically images defects based on location data imported from a mask inspection system. Compared with the previous E5610, it has many improvements aimed at next-generation masks for EUV lithography.
SEM spatial resolution is 2 nm. Elemental analysis (EDS, energy resolution 127 eV) and backscattered electron analysis are available as options. It handles 6025-size photomasks.
Key features
- Spatial resolution of 2 nm
- Automatic imaging linked with mask inspection systems
- EDS and backscattered electron analysis (optional)
Applications
- Defect review and classification for EUV masks
Other mask inspection equipment
- ABICS E120 · Lasertec
- ABICS E320 · Lasertec
- ACTIS A150 · Lasertec
- ACTIS A200HiT series · Lasertec
- ACTIS A300 series · Lasertec
- BASIC series · Lasertec
- MAGICS M6750 / M6751 · Lasertec
- MAGICS M9650 / M9651 · Lasertec
More from Advantest
- 7038 System-Level Test System · Final test equipment
- B6700 series · Burn-in systems
- EVA100 · Analog test systems
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- H5620 · Memory test systems
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- HA7200 · MEMS manufacturing equipment
- HA7300 · MEMS manufacturing equipment
Sources
Last updated: October 23, 2026