ACTIS A300 series
An actinic EUV patterned mask defect inspection system that detects printable defects on EUV masks for High-NA lithography. It also handles pellicle-mounted masks.
Maker: Lasertec · Official product page
Specifications
| Type | Actinic inspection (EUV light, URASHIMA light source) |
|---|---|
| Target | EUV masks for High-NA and current NA (pellicle-mounted masks supported) |
| Announced | November 2023 |
Specifications as published by the maker. See the sources below.
Overview
The ACTIS A300 series is Lasertec's actinic EUV patterned mask defect inspection system, announced in November 2023. It is designed to detect defects that print in High-NA lithography and also handles pellicle-mounted masks.
It supports defect inspection of both EUV masks for High-NA lithography and EUV masks for lithography at the current NA.
Highly efficient optical design and the URASHIMA light source give high productivity. It is used for defect inspection in EUV mask manufacturing and for incoming and periodic quality inspection of EUV masks at wafer fabs.
Key features
- Supports EUV masks for High-NA
- Supports pellicle-mounted masks
- URASHIMA light source
Applications
- Defect inspection in EUV mask manufacturing
- Incoming and periodic inspection of EUV masks at fabs
Other mask inspection equipment
- MASK DR-SEM E5620 · Advantest
- ABICS E120 · Lasertec
- ABICS E320 · Lasertec
- ACTIS A150 · Lasertec
- ACTIS A200HiT series · Lasertec
- BASIC series · Lasertec
- MAGICS M6750 / M6751 · Lasertec
- MAGICS M9650 / M9651 · Lasertec
More from Lasertec
- BGM300 · TSV formation equipment
- BIM300 · Surface profilers
- CIEL series · Macro inspection equipment
- CIRIUS series · Defect inspection equipment
- EZ300 · Macro inspection equipment
- GALOIS211 · Crystal defect inspection equipment
- LX series · Macro inspection equipment
- MAGICS M5640 · Wafer substrate inspection equipment
Sources
Last updated: October 23, 2026