ABICS E120
An inspection and review system that uses EUV light to detect printable phase defects inside the Mo/Si multilayer of EUV mask blanks.
Maker: Lasertec · Official product page
Specifications
| Type | Actinic inspection (13.5 nm), dark-field optics |
|---|---|
| Target | EUV mask blanks (Mo/Si multilayer) |
| Awards | 2017 Top 10 New Products Award, Semiconductor of the Year 2018 Grand Prix |
Specifications as published by the maker. See the sources below.
Overview
ABICS E120 is Lasertec's EUV mask blank defect inspection and review system, announced in April 2017.
Actinic inspection with a 13.5 nm EUV light source sensitively detects printable phase defects inside the Mo/Si multilayer. Dark-field optics give sensitive, fast inspection, and high-magnification review obtains accurate defect coordinates.
Defects are analyzed with bright-field and dark-field review. It received the Nippon Ryoku Award in the Nikkan Kogyo Shimbun's 2017 Top 10 New Products Award and the Grand Prix in the semiconductor manufacturing equipment category of Semiconductor of the Year 2018.
Key features
- Blank inspection with EUV light
- Fast dark-field inspection
- Accurate defect coordinates
Applications
- Inspection and defect analysis of EUV mask blanks
Other mask inspection equipment
- MASK DR-SEM E5620 · Advantest
- ABICS E320 · Lasertec
- ACTIS A150 · Lasertec
- ACTIS A200HiT series · Lasertec
- ACTIS A300 series · Lasertec
- BASIC series · Lasertec
- MAGICS M6750 / M6751 · Lasertec
- MAGICS M9650 / M9651 · Lasertec
More from Lasertec
- BGM300 · TSV formation equipment
- BIM300 · Surface profilers
- CIEL series · Macro inspection equipment
- CIRIUS series · Defect inspection equipment
- EZ300 · Macro inspection equipment
- GALOIS211 · Crystal defect inspection equipment
- LX series · Macro inspection equipment
- MAGICS M5640 · Wafer substrate inspection equipment
Sources
Last updated: October 23, 2026