ABICS E320
A system that inspects next-generation EUV mask blanks for tiny phase defects with EUV light and measures defect coordinates accurately.
Maker: Lasertec · Official product page
Specifications
| Type | Actinic inspection (13.5 nm), 40x dark-field optics |
|---|---|
| Review | 1,500x high magnification, bright field / dark field |
| Target | Next-generation EUV mask blanks (Mo/Si multilayer) |
Specifications as published by the maker. See the sources below.
Overview
ABICS E320 is Lasertec's EUV mask blank defect inspection and review system, announced in December 2024. It sensitively inspects next-generation EUV mask blanks for tiny phase defects and measures defect coordinates with high accuracy.
Actinic inspection with a 13.5 nm EUV light source sensitively detects printable phase defects inside the reflective multilayer (Mo/Si). 40x dark-field optics give sensitive, fast inspection, and 1,500x high-magnification review measures defect coordinates accurately.
Bright-field and dark-field review classify defects and identify false defects, and the system outputs accurate coordinates for mitigation, which avoids defects when patterning the mask.
Key features
- Blank inspection with EUV light
- 40x dark field and 1,500x review
- Output of accurate defect coordinates
Applications
- Phase defect inspection of next-generation EUV mask blanks
Other mask inspection equipment
- MASK DR-SEM E5620 · Advantest
- ABICS E120 · Lasertec
- ACTIS A150 · Lasertec
- ACTIS A200HiT series · Lasertec
- ACTIS A300 series · Lasertec
- BASIC series · Lasertec
- MAGICS M6750 / M6751 · Lasertec
- MAGICS M9650 / M9651 · Lasertec
More from Lasertec
- BGM300 · TSV formation equipment
- BIM300 · Surface profilers
- CIEL series · Macro inspection equipment
- CIRIUS series · Defect inspection equipment
- EZ300 · Macro inspection equipment
- GALOIS211 · Crystal defect inspection equipment
- LX series · Macro inspection equipment
- MAGICS M5640 · Wafer substrate inspection equipment
Sources
Last updated: October 23, 2026