BASIC series
A system that combines particle detection, height measurement and cleaning of the EUV mask back side in one tool. Semiconductor of the Year 2013 Grand Prix.
Maker: Lasertec · Official product page
Specifications
| Functions | Back-side particle detection, particle height measurement, cleaning |
|---|---|
| Target | EUV masks (6 inch) |
| Dimensions | 1,550 × 2,955 × 2,400 mm |
Specifications as published by the maker. See the sources below.
Overview
The BASIC series is Lasertec's EUV mask back-side inspection and cleaning system. It was announced in February 2013 and won the Grand Prix in the semiconductor manufacturing equipment category of Semiconductor of the Year 2013.
It combines in one tool the detection of particles on the back of EUV masks, measurement of the height of particles that would affect EUV exposure, and cleaning (removal) of those particles.
Dual Pod handling with no risk of particle generation and a scanning method that does not damage patterns achieve inspection times usable in EUV volume production. Fully automatic inspection linked to OHT and a compact all-in-one design with built-in power and control systems are further strengths.
Key features
- Detection, height measurement and cleaning in one tool
- Dual Pod handling
- Fully automatic inspection linked to OHT
Applications
- Periodic control and incoming inspection of EUV mask back sides
Other mask inspection equipment
- MASK DR-SEM E5620 · Advantest
- ABICS E120 · Lasertec
- ABICS E320 · Lasertec
- ACTIS A150 · Lasertec
- ACTIS A200HiT series · Lasertec
- ACTIS A300 series · Lasertec
- MAGICS M6750 / M6751 · Lasertec
- MAGICS M9650 / M9651 · Lasertec
More from Lasertec
- BGM300 · TSV formation equipment
- BIM300 · Surface profilers
- CIEL series · Macro inspection equipment
- CIRIUS series · Defect inspection equipment
- EZ300 · Macro inspection equipment
- GALOIS211 · Crystal defect inspection equipment
- LX series · Macro inspection equipment
- MAGICS M5640 · Wafer substrate inspection equipment
Sources
Last updated: October 23, 2026