Mask inspection equipment
Mask inspection equipment finds defects and particles on photomasks and mask blanks before and during use, because a defect on the mask can be printed onto every wafer exposed through it. Inspection covers blanks, patterned masks, pellicles, the mask back side and the mask edge.
What it does
EUV masks have raised the bar: actinic inspection with 13.5 nm EUV light finds defects that print at the same wavelength used for exposure, while DUV-based systems remain widely used for particle and pattern inspection.
Products (16)
- MASK DR-SEM E5620 · Advantest
A defect review SEM that reviews and classifies tiny defects on photomasks. It automatically images the defect locations found by mask inspection systems.
- ABICS E120 · Lasertec
An inspection and review system that uses EUV light to detect printable phase defects inside the Mo/Si multilayer of EUV mask blanks.
- ABICS E320 · Lasertec
A system that inspects next-generation EUV mask blanks for tiny phase defects with EUV light and measures defect coordinates accurately.
- ACTIS A150 · Lasertec
The world's first EUV patterned mask defect inspection system. It uses 13.5 nm EUV light, the same as exposure, to sensitively detect defects that print.
- ACTIS A200HiT series · Lasertec
A high-throughput actinic EUV mask inspection system for wafer fabs with 3 times the inspection speed of ACTIS A150.
- ACTIS A300 series · Lasertec
An actinic EUV patterned mask defect inspection system that detects printable defects on EUV masks for High-NA lithography. It also handles pellicle-mounted masks.
- BASIC series · Lasertec
A system that combines particle detection, height measurement and cleaning of the EUV mask back side in one tool. Semiconductor of the Year 2013 Grand Prix.
- MAGICS M6750 / M6751 · Lasertec
A mask blank defect inspection and review system with higher sensitivity to defects on resist. It scans with 63 beams.
- MAGICS M9650 / M9651 · Lasertec
A defect inspection and review system for EUV mask blanks. It won the Semiconductor of the Year 2019 Grand Prix.
- MAGICS M9750 / M9751 · Lasertec
A defect inspection and review system for next-generation EUV mask blanks that combines high detection sensitivity with high throughput for volume production.
- MATRICS X712 series · Lasertec
A mask defect inspection system for mature nodes with Die-to-Database, Die-to-Die and Single Die inspection modes.
- MATRICS X810EX series · Lasertec
A high-sensitivity, high-speed, low-CoO defect inspection system for DUV masks. It scans a 100 mm square in 38 minutes.
- MATRICS X8ULTRA series · Lasertec
A mask inspection system for both EUV masks without pellicles and DUV masks. It offers mask-to-mask comparison inspection.
- MATRICS X9ULTRA series · Lasertec
A mask inspection system dedicated to EUV masks without pellicles. A high-power 193 nm laser and a high-NA objective detect tiny particles.
- MZ100 · Lasertec
A mask edge inspection system that inspects the edges (side faces and bevels) of EUV and DUV photomasks with confocal optics.
- PELMIS series · Lasertec
An EUV pellicle particle inspection system that inspects particles on the pellicle of pellicle-mounted EUV masks and automatically determines which side they are on.
Japanese makers in this category
Other front-end equipment
Sources
- Advantest: E5620 product page
- Lasertec: ABICS E120 product page
- Lasertec: ABICS E320 product page
- Lasertec: ACTIS A150 product page
- Lasertec: ACTIS A200HiT product page
- Lasertec: ACTIS A300 product page
- Lasertec: BASIC series product page
- Lasertec: MAGICS M6750 / M6751 product page
- Lasertec: MAGICS M9650 / M9651 product page
- Lasertec: MAGICS M9750 / M9751 product page
- Lasertec: MATRICS X712 product page
- Lasertec: MATRICS X810EX product page
- Lasertec: MATRICS X8ULTRA product page
- Lasertec: MATRICS X9ULTRA product page
- Lasertec: MZ100 product page
- Lasertec: PELMIS product page
Related calculators
Japanese equipment by category
Last updated: October 23, 2026