Mask inspection equipment

ACTIS A150

The world's first EUV patterned mask defect inspection system. It uses 13.5 nm EUV light, the same as exposure, to sensitively detect defects that print.

Maker: Lasertec · Official product page

Specifications


TypeActinic inspection (EUV light, 13.5 nm)
TargetEUV masks (pellicle-mounted masks supported)
Awards2019 Top 10 New Products Award, Semiconductor of the Year 2020 Grand Prix

Specifications as published by the maker. See the sources below.

Overview


ACTIS A150 is Lasertec's actinic EUV patterned mask defect inspection system. It was announced in September 2019 as the world's first EUV patterned mask defect inspection system.

Its EUV light source with a wavelength of 13.5 nm greatly improves defect detection sensitivity over conventional DUV light sources. Because it inspects with light of the same wavelength as the wafer exposure tool (actinic inspection), it can sensitively detect defects that print during exposure. It can also inspect pellicle-mounted EUV masks.

It received the Nippon Ryoku Award in the Nikkan Kogyo Shimbun's 2019 Top 10 New Products Award and the Grand Prix in the semiconductor manufacturing equipment category of Semiconductor of the Year 2020. It is used in EUV mask manufacturing and for incoming and periodic inspection at fabs.

Key features


Applications


Other mask inspection equipment


All mask inspection equipment and Japanese suppliers

More from Lasertec


Sources


  1. Lasertec: ACTIS A150 product page

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Last updated: October 23, 2026