Plasma process monitor C10346-01
Hamamatsu Photonics' instrument that detects plasma emission during etching, sputtering and CVD in real time over a wide band.
Maker: Hamamatsu Photonics · Official product page
Specifications
| Measurement method | Plasma optical emission spectroscopy |
|---|---|
| Monitored items | Endpoint detection, estimation of plasma species, impurities and abnormal discharge |
| Main applications | Endpoint detection for etching and cleaning |
Specifications as published by the maker. See the sources below.
Overview
C10346-01 is Hamamatsu Photonics' plasma process monitor. It is a spectroscopic measurement system that detects plasma emission during processing in real time over a wide wavelength band.
The measurement wavelength is 200 to 950 nm, wavelength resolution 2 nm or less (FWHM) and wavelength accuracy ±0.75 nm. It has various analysis functions and can output decisions on up to 5 channels as TTL signals. The interface is USB 2.0.
It is used for endpoint detection in etching and cleaning, monitoring plasma conditions by estimating chemical species in the plasma, and detecting impurity contamination and abnormal discharge. Target processes include etching, sputtering and CVD.
Key features
- Real-time detection of plasma emission from 200 to 950 nm
- Wavelength resolution of 2 nm or less
- TTL decision outputs on up to 5 channels
Applications
- Endpoint detection for etching and cleaning
- Plasma condition monitoring and detection of abnormal discharge
Other process monitors (epd/oes)
- FE-300F film thickness monitor · Otsuka Electronics
More from Hamamatsu Photonics
- Photoionizer L12645 · Ionizers (static elimination)
- PHEMOS-X emission microscope C15765-01 · Failure analysis equipment
Sources
Equipment components and subsystems: more products
Last updated: October 23, 2026