FE-300F film thickness monitor
Otsuka Electronics' film thickness monitor that measures thickness without contact or damage by spectral interferometry.
Maker: Otsuka Electronics · Official product page
Specifications
| Measurement method | Spectral interferometry (reflectance measurement in the ultraviolet range) |
|---|---|
| Monitored items | Film thickness 10 nm to 1.5 mm (as fast as 0.1 seconds) |
| Main applications | Thickness control of thin and thick films |
Specifications as published by the maker. See the sources below.
Overview
FE-300F is Otsuka Electronics' film thickness monitor. Using optical interference, it analyzes reflection spectra with a spectrophotometer and determines optical film thickness from the refractive index.
The measurement range is 3 nm to 35 µm (SiO₂ equivalent), the spot diameter φ1.2 mm and the wavelength range 300 to 800 nm. The measurement range can be chosen by selecting the spectrophotometer and light source, and because it measures absolute reflectance, optical constants can also be analyzed.
Its strengths are compact size, affordable price and ease of use, with real-time monitoring and simulation functions. Besides oxide films, resists, SiC and GaN in semiconductors, it measures the thickness of transparent conductive films, retardation films, DLC coatings, optical filters and LCD and OLED components.
Key features
- Film thickness measurement by optical interference
- 3 nm to 35 µm (SiO₂ equivalent), spot φ1.2 mm
- Real-time monitoring and simulation
- Compact and affordable
Applications
- Thickness monitoring of oxide films, resists and other films
- Thickness measurement of functional films and optical components
Other process monitors (epd/oes)
- Plasma process monitor C10346-01 · Hamamatsu Photonics
More from Otsuka Electronics
- FE-5000 series · Ellipsometers
Sources
Equipment components and subsystems: more products
Last updated: October 23, 2026