CS5000
A CD-SEM for 3, 4, 6 and 8-inch wafers. It handles many materials, including SiC, GaN and glass.
Maker: Hitachi High-Tech · Official product page
Specifications
| Secondary electron image sharpness | 3.8 nm or less (800 V accelerating voltage) |
|---|---|
| Wafer size | 75 (with conditions), 100, 150, 200 mm |
| Dimensions | 1,180 × 2,520 × 1,990 mm |
Specifications as published by the maker. See the sources below.
Overview
CS5000 is Hitachi High-Tech's high-resolution FEB measurement system (CD-SEM). It is a CD-SEM for 3, 4, 6 and 8-inch wafers that carries Hitachi's leading-edge metrology technology, with better secondary electron resolution and measurement repeatability than the previous model.
It automates measurement operations to raise productivity on existing lines. Simple changeover allows automatic transfer of up to 3 wafer sizes, and it handles many materials, including insulating wafers such as SiC, GaN and glass. New electron optical conditions allow measurement of insulating wafers that the previous model could not measure.
Its dimensions and operating screens are designed for replacing or running alongside existing tools, and greatly improved wafer transfer raises capacity in continuous measurement. It is suited to high-mix volume production of semiconductor devices.
Key features
- Multiple wafer sizes from 3 to 8 inch
- Handles SiC, GaN and glass
- Secondary electron image sharpness of 3.8 nm or less
- Automated measurement
Applications
- Dimension measurement of power and compound devices
- CD control on lines of 200 mm and smaller
Other cd-sems
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Sources
Last updated: October 23, 2026