CD-SEMs
A CD-SEM (critical dimension scanning electron microscope) measures the width of lines, spaces and holes on the wafer from electron beam images. It is the main tool for checking that patterns after lithography and etching are the intended size.
What it does
Advanced CD-SEMs use low landing energies to avoid damaging thin resists, high accelerating voltages to see the bottom of deep holes in 3D NAND, and close matching between tools so that every tool on a production line reports the same value.
Products (4)
- CG7300 · Hitachi High-Tech
Hitachi High-Tech's high-reliability CD-SEM for volume production of EUV generation devices. Tool-to-tool matching is about 10% better than the previous model.
- CS5000 · Hitachi High-Tech
A CD-SEM for 3, 4, 6 and 8-inch wafers. It handles many materials, including SiC, GaN and glass.
- CV7300 · Hitachi High-Tech
An in-line CD measurement SEM with 60 kV accelerating voltage. It measures deep holes and trenches in 3D NAND with 200 or more layers and overlay in advanced DRAM and logic.
- GT2000 · Hitachi High-Tech
Hitachi High-Tech's CD-SEM for development and volume production of High-NA EUV generation devices. It offers ultra-low 100 V accelerating voltage and very fast multi-point measurement.
Japanese makers in this category
- Hitachi High-Tech · 4 product(s) listed
Other front-end equipment
- ALD equipment (5)
- Batch wafer cleaning equipment (5)
- Coater/developers (9)
- Crystal defect inspection equipment (3)
- CVD equipment (7)
- Diffusion furnaces (5)
- Dry cleaning equipment (3)
- Dry etching equipment (4)
- DUV lithography systems (10)
- Ellipsometers (3)
- Film thickness metrology (3)
- High-energy ion implanters (3)
Sources
Related calculators
Last updated: October 23, 2026