ei-5 / EVD-600LP
ei-5, a general-purpose evaporation system for R&D and small-volume production, and EVD-600LP, a production evaporation system for lift-off.
Maker: ULVAC · Official product page
Specifications
| Evaporation source | EB gun, resistance heating |
|---|---|
| Substrate | Φ50 to 200 mm and rectangular; Si, compound, glass, ceramic |
| Substrate holder | Orbital, planetary, satellite (ei-5) |
Specifications as published by the maker. See the sources below.
Overview
ei-5 and EVD-600LP are ULVAC's batch evaporation systems. There is a general-purpose model, ei-5, for R&D through small-volume production, and a production model, EVD-600LP, for lift-off processes.
They deposit metals and oxides on substrates, and centralized control from the operating panel runs pumping and deposition automatically. They can carry a variety of evaporation sources, such as EB, resistance heating and a combination of both, and functions such as recipes, data logging and maintenance support are operated from a PC.
They handle many kinds of substrates, including Φ50 to 200 mm and rectangular substrates of Si, compound semiconductors, glass and ceramic. EVD improves lift-off performance and holds more substrates. They are used for electrode formation in compound devices such as power devices, and in LEDs, LDs and high-speed devices.
Key features
- General-purpose model and lift-off production model
- A variety of evaporation sources
- Supports many kinds of substrates
Applications
- Electrode evaporation for compound devices
- Lift-off processes
Other vacuum evaporation equipment
More from ULVAC
- CC-200 · PECVD equipment
- CCMT-D series · Vacuum gauges
- CME · PECVD equipment
- CME-200E · CVD equipment
- CS · Sputtering equipment
- ENTRON-EX W300 · PVD equipment
- ENTRON-EXX · PVD equipment
- H83 / H84 · Diffusion furnaces
Sources
Vacuum evaporation equipment
Last updated: October 23, 2026