Rapid thermal processing (RTP) equipment
RTP (rapid thermal processing) equipment heats one wafer at a time to a high temperature for a short, precisely controlled time, using lamps or heated susceptors. Short heating limits how far dopants diffuse, which is essential for shallow junctions.
What it does
Single-wafer thermal and plasma treatment tools are used for annealing, curing and degassing films, and for nitridation and oxidation of thin gate dielectrics.
Products (3)
- MARORA® · Kokusai Electric
A single-wafer treatment system that produces low-electron-temperature plasma of about 1 eV with KOKUSAI's own MMT method. It is used for plasma nitridation and oxidation of gate dielectrics.
- TANDUO · Kokusai Electric
KOKUSAI ELECTRIC's single-wafer thermal process system. Annealing and thin film formation can be selected in a modular configuration, handling short processes that batch furnaces struggle with.
- Triase+™ SPAi · Tokyo Electron (TEL)
TEL's single-wafer plasma processing system that uses high-density, low-electron-temperature plasma from an SPA (slot plane antenna) for low-temperature, low-damage processing.
Japanese makers in this category
- Kokusai Electric · 2 product(s) listed
- Tokyo Electron (TEL) · 1 product(s) listed
Other front-end equipment
Sources
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Japanese equipment by category
Rapid thermal processing (RTP) equipment
Last updated: October 23, 2026