Rapid thermal processing (RTP) equipment

Triase+™ SPAi

Name: Triase+ SPAi
Brand: Tokyo Electron (TEL)

TEL's single-wafer plasma processing system that uses high-density, low-electron-temperature plasma from an SPA (slot plane antenna) for low-temperature, low-damage processing.

Maker: Tokyo Electron (TEL) · Official product page

Specifications

Type	SPA plasma processing (with bias function)
Key feature	High-density, low-electron-temperature plasma
Main applications	Gate nitridation, gate repair oxidation, STI liner oxidation, high-k nitridation

Specifications as published by the maker. See the sources below.

Overview

Triase+ SPAi is a single-wafer plasma processing system from Tokyo Electron (TEL). It was developed as the next generation of the proven, reliable Triase+ SPA series, with a focus on higher productivity and lower environmental impact.

The SPA series uses high-density plasma with a low electron temperature, generated by TEL's long-developed SPA (Slot Plane Antenna) technology, for low-temperature processing with little damage. SPAi keeps these strengths while raising throughput, and also cuts CO₂ emissions through lower power consumption and reduces footprint.

A bias function gives both good film quality and high coverage. It handles critical front-end steps such as gate nitridation, gate repair oxidation, STI liner oxidation and high-k nitridation.

Key features

High-density, low-electron-temperature plasma from SPA
Low-temperature, low-damage processing
Bias function
Lower CO₂ emissions and smaller footprint

Applications

Gate nitridation and repair oxidation
STI liner oxidation
High-k nitridation

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Sources

TEL: Triase+ series product page