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Batch wafer cleaning equipment

ZETA™+

Tokyo Electron's batch spray cleaning system. Its ViPR+ high-temperature chemical technology strips films such as resist and silicide in a short time.

Maker: Tokyo Electron (TEL) · Official product page

Specifications

Wafer size200 / 300 mm (150 / 200 mm for the semi-automatic model)
TypeBatch spray (sealed single chamber, up to 8 chemicals)
Throughput450 wph (200 mm) / 230 wph (300 mm)
Main applicationsResist and metal strip, post-etch cleaning, RCA cleaning, DHF etch

Specifications as published by the maker. See the sources below.

Overview

ZETA+ is a batch spray cleaning system from Tokyo Electron. It handles both the stripping of films such as resist and silicide and general cleaning efficiently and flexibly, and has a large installed base.

TEL's ViPR+ technology, which enables high-temperature chemical processing, strips resist, silicide and other films in a short time for a high-performance, high-productivity, low-cost process. It is also used for FEOL and BEOL post-etch cleaning, RCA cleaning and DHF wet etching.

There are two models: the fully automatic ZETA+200/300 for 300 / 200 mm wafers and a semi-automatic model for 200 / 150 mm. The automatic model supports FOUP and SMIF with a mini-environment, supplies up to 8 chemicals to a sealed single chamber, and sets mixing ratio, concentration and temperature by recipe. It is more economical than single-wafer cleaning systems.

Key features

Applications

Other batch wafer cleaning equipment

All batch wafer cleaning equipment and Japanese suppliers

More from Tokyo Electron (TEL)

Sources

  1. Tokyo Electron: ZETA+ series product page

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Batch wafer cleaning equipment

Last updated: October 23, 2026