Batch wafer cleaning equipment
Batch cleaning equipment processes many wafers at once by moving cassettes or wafer boats through a series of chemical tanks and rinse baths. It is used for cleaning before oxidation and diffusion, after etching, and for wet etching and stripping steps where many wafers need the same treatment.
What it does
Compared with single-wafer cleaning, batch tools offer high throughput and low chemical use per wafer, while single-wafer tools give tighter control of each wafer.
Products (5)
- CW-2000 · SCREEN Holdings
A compact batch cleaning system with about 45% less footprint and 1.5 times the productivity. It handles 50 to 200 mm wafers.
- FC-3100 · SCREEN Holdings
SCREEN's batch wet station. Fast transfer and buffer modules process 1,000 wafers per hour, and the HiLPD reduced-pressure drying system suppresses watermarks and pattern collapse.
- FC-821L · SCREEN Holdings
A space-saving batch cleaning system with half-pitch transfer and one-bath processing.
- WS-620C / WS-820C / WS-820L · SCREEN Holdings
A high-throughput batch cleaning system with a freely configurable line layout. It comes in two transfer types: carrier and carrierless.
- ZETA™+ · Tokyo Electron (TEL)
Tokyo Electron's batch spray cleaning system. Its ViPR+ high-temperature chemical technology strips films such as resist and silicide in a short time.
Japanese makers in this category
- SCREEN Holdings · 4 product(s) listed
- Tokyo Electron (TEL) · 1 product(s) listed
Other front-end equipment
Sources
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Batch wafer cleaning equipment
Last updated: October 23, 2026