Coater/developers

CLEAN TRACK LITHIUS Pro Z

A 300 mm coater/developer for the 10 nm node and beyond, long used in volume production for advanced lithography, including EUV.

Maker: Tokyo Electron (TEL) · Official product page

Specifications


Wafer size300 mm
Supported nodes10 nm node and beyond
Throughput300 wph inline
Supported processesEUV, immersion, ArF, KrF, i-line, SOC
Related modelsLITHIUS Pro AP for 300 mm / 200 mm (derivative)
Main applicationsResist coating, development and bakes

Specifications as published by the maker. See the sources below.

Overview


CLEAN TRACK LITHIUS Pro Z is a 300 mm coater/developer from Tokyo Electron (TEL). It coats wafers with resist, develops them after exposure and performs the bakes in between, connected inline to the scanner.

It supports leading-edge lithography at the 10 nm node and below and handles EUV, immersion, ArF, KrF, i-line and SOC (spin-on carbon) processes. Throughput is 300 wph inline. A low-particle transfer system and a design that does not touch the wafer bevel help reduce defects.

The LITHIUS series builds on the CLEAN TRACK ACT series, which held a large market share. It also includes LITHIUS Pro DICE for EUV, including high-NA EUV (440 wph inline), and LITHIUS Pro AP for packaging.

Key features


Applications


FAQ


What is the difference between LITHIUS Pro Z and LITHIUS Pro DICE?

Pro DICE supports EUV processes including high-NA, runs at 440 wph inline and adds stronger defect control and tool data collection. Pro Z targets the 10 nm node and below at 300 wph inline.

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More from Tokyo Electron (TEL)


Sources


  1. Tokyo Electron: LITHIUS series product page

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Last updated: October 23, 2026