ANTARES™
Tokyo Electron's 300 mm single-wafer dry cleaning system, which turns gas into a low-temperature aerosol to remove only particles. It does not damage Cu or low-k films.
Specifications
| Wafer size | 300 mm |
|---|---|
| Type | Single-wafer, low-temperature aerosol (fully dry, no chemicals or water) |
| Main applications | Particle removal from fine patterns (FEOL to BEOL) |
Specifications as published by the maker. See the sources below.
Overview
ANTARES is a fully automatic single-wafer aerosol cleaning system for 300 mm wafers from Tokyo Electron. TEL's own technology turns the supplied gas into an aerosol at low temperature and stably removes only the fine particles on the device surface.
Unlike conventional wet cleaning, the process is fully dry and uses neither chemicals nor water. It therefore reduces defects without damaging Cu or low-k films, and suppresses corrosion of various metals, watermark formation and surface charge-up.
Because it can process even very sensitive thin films in a dry environment without surface reactions, roughening or etch damage, it is used to reduce defects across a wide range of steps from the back end to the front end and helps improve yield.
Key features
- Fully dry cleaning with low-temperature aerosol (no chemicals or water)
- Particle removal without damage to Cu or low-k films
- Suppresses corrosion, watermarks and surface charge
Applications
- Particle removal from fine pattern surfaces
- Defect reduction from BEOL (Cu / low-k) to FEOL
Other dry cleaning equipment
- Certas LEAGA™ · Tokyo Electron (TEL)
- RISE-300 · ULVAC
More from Tokyo Electron (TEL)
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- Cellcia™ · Wafer probers
- CELLESTA™-i · Single-wafer cleaning equipment
- CELLESTA™-i MD · Single-wafer cleaning equipment
- CELLESTA™ MS2 · Wafer scrubbers
- CELLESTA™ Pro SPM · Wet resist strip equipment
- CELLESTA™ SCD · Wafer dryers
- CLEAN TRACK™ LITHIUS Pro™ · Coater/developers
Sources
Dry cleaning equipment
Last updated: October 23, 2026