RF-200EX / RF-300EX
Coater/developers for next-generation power and automotive devices. RF-200EX is dedicated to 200 mm, and RF-300EX handles thin wafers.
Maker: SCREEN Holdings · Official product page
Specifications
| Wafer size | 150 to 200 mm (RF-200EX) |
|---|---|
| Supported chemicals | Resist, polyimide, SOC and others (RF-300EX) |
| Key feature | Lower resist and power consumption |
Specifications as published by the maker. See the sources below.
Overview
RF-200EX and RF-300EX are SCREEN's coater/developers (coating and developing systems) for next-generation power and automotive devices. Building on long experience in coating and developing, they combine high productivity with a small footprint. Resist consumption during coating and power consumption during operation are also reduced.
RF-200EX is designed specifically for 200 mm wafers, achieving a small footprint and support for DUV processes. A new platform dedicated to 150 to 200 mm was designed based on multi-level technology from 300 mm tools, bringing over leading-edge unit technologies for lower chemical use, fewer particles and defects, and easier maintenance.
RF-300EX has transfer and holding mechanisms designed for thin wafers, coating and developing them stably without breakage. Dispense systems can be chosen according to the type and viscosity of the chemical, supporting a wide range of chemicals such as resist, polyimide and SOC.
Key features
- Platform dedicated to 200 mm
- Thin wafer support (RF-300EX)
- Supports many chemicals
- Lower resist and power use
Applications
- Lithography for power and automotive devices
Other coater/developers
- DT-3000 (SOKUDO DUO) · SCREEN Holdings
- SC-80EX · SCREEN Holdings
- SK-60EX / SK-80EX · SCREEN Holdings
- CLEAN TRACK™ LITHIUS Pro™ · Tokyo Electron (TEL)
- CLEAN TRACK™ LITHIUS Pro™ AP · Tokyo Electron (TEL)
- CLEAN TRACK LITHIUS Pro DICE · Tokyo Electron (TEL)
- CLEAN TRACK™ LITHIUS Pro™ V · Tokyo Electron (TEL)
- CLEAN TRACK LITHIUS Pro Z · Tokyo Electron (TEL)
More from SCREEN Holdings
Sources
Last updated: October 23, 2026