CELLESTA™-i
Tokyo Electron's single-wafer cleaning system for 300 mm wafers. It carries up to 20 cleaning chambers to raise productivity per unit of cleanroom floor area.
Specifications
| Wafer size | 300 mm |
|---|---|
| Type | Single-wafer |
| Chamber configuration | Up to 20 chambers |
| Key technologies | Chemical recycling, physical cleaning, bevel cleaning and backside cleaning units |
| Related models | CELLESTA-i MD (for 10 nm and below), CELLESTA MS2 (double-sided physical cleaning) |
Specifications as published by the maker. See the sources below.
Overview
CELLESTA-i is a single-wafer cleaning system for 300 mm wafers from Tokyo Electron. It raises productivity while keeping the footprint small, greatly reducing cleanroom floor space compared with earlier systems.
It can carry up to 20 cleaning chambers, and its productivity per m² is described as among the highest in the world. It includes chemical recycling technology to lower cost of ownership and physical cleaning to remove particles from the wafer. Bevel cleaning units dedicated to the wafer edge and backside cleaning units that use little chemical can also be added, making the system highly expandable.
The series also includes CELLESTA-i MD, which supports cleaning processes at the 10 nm node and below with drying that suppresses pattern collapse, and CELLESTA MS2, which cleans both sides at the same time with two-fluid spray and brushes.
Key features
- Up to 20 chambers, with productivity per m² among the highest in the world
- Low cost of ownership through chemical recycling
- Optional physical, bevel and backside cleaning units
Applications
- Single-wafer wet cleaning in 300 mm volume production lines
- Bevel and backside cleaning
Also listed under: Wet cleaning equipment
FAQ
What is the difference between CELLESTA-i and CELLESTA-i MD?
CELLESTA-i MD develops the basic concept of CELLESTA-i further. It supports cleaning at the 10 nm node and below and uses chamber atmosphere control and TEL's own IPA dispense technology to dry wafers while suppressing pattern collapse.
Other single-wafer cleaning equipment
- SU-2000 · SCREEN Holdings
- SU-3300 · SCREEN Holdings
- CELLESTA™-i MD · Tokyo Electron (TEL)
More from Tokyo Electron (TEL)
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- ANTARES™ · Dry cleaning equipment
- Cellcia™ · Wafer probers
- CELLESTA™ MS2 · Wafer scrubbers
- CELLESTA™ Pro SPM · Wet resist strip equipment
- CELLESTA™ SCD · Wafer dryers
- Certas LEAGA™ · Dry cleaning equipment
- CLEAN TRACK™ LITHIUS Pro™ · Coater/developers
Sources
Single-wafer cleaning equipment
Last updated: October 23, 2026